Interface properties study of black silicon solar cells with front surface a-Si:H/c-Si heterojunction

Abstract

The exceptionally low reflectance of black silicon across a broad wavelength range makes it an intriguing surface texture for solar cell applications. Silicon heterojunction (SHJ) solar cells fabricated on black silicon (Si) formed by dry reactive ion etching (RIE) using inductive coupled plasma (ICP) on n-type Si are explored. The study is focused on the properties of the a-Si:H/c-Si interface, being a key issue for the photovoltaic performance of SHJ. Deep-level transient spectroscopy (DLTS) detected no radiation defect in Si after the etching. The surface of black Si was passivated with an intrinsic a-Si:H layer, followed by the deposition of p-type and n-type a-Si:H on the front and back sides, respectively. The SHJ solar cell photovoltaic performance based on black Si is strongly influenced by defect density at the a-Si:H/Si interface. Admittance spectroscopy and effective charge carrier lifetime measurements demonstrate that interface defect density decreases with the increase of (i)a-Si:H thickness. The value of 0.75 ms effective charge carrier lifetime was reached for single (i) a-Si:H layer passivation and 0.25 ms when (p)a-Si:H was deposited over the intrinsic a-Si:H layer. The measured open circuit voltage (VOC) values for the SHJ solar cells increase with the (i)a-Si:H layer thickness reaching 658 mV. However, the fill factor decreases with increasing (i) a-Si:H layer thickness, limiting the efficiency at the maximum value below 14% due to the thickness uniformity of the a-Si:H layer. The development of conformal growth of a-Si:H is a key issue for further improvement of black Si heterojunction solar cell photovoltaic performance.