2010
DOI: 10.1016/j.jcis.2010.07.051
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Interface roughness of plasma deposited polymer layers

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Cited by 14 publications
(19 citation statements)
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“…The ppAA films deposited at a higher plasma power level ( P = 90 W) resulted in a higher cross‐linking density than those deposited at a lower power level ( P = 5 W) . Generally, films deposited at higher input power showed a higher roughness and cross‐linking density . The energetic ion bombardment and UV irradiation during the plasma deposition process determine the cross‐linking density of the film …”
Section: Methodsmentioning
confidence: 98%
See 1 more Smart Citation
“…The ppAA films deposited at a higher plasma power level ( P = 90 W) resulted in a higher cross‐linking density than those deposited at a lower power level ( P = 5 W) . Generally, films deposited at higher input power showed a higher roughness and cross‐linking density . The energetic ion bombardment and UV irradiation during the plasma deposition process determine the cross‐linking density of the film …”
Section: Methodsmentioning
confidence: 98%
“…This in turn affects the cross‐linking density and mobility of polymeric chains . In general, it has been shown that films deposited at a higher input power level exhibit a higher cross‐linking density . Thereby E , the film's hardness and its wear resistance can all be increased …”
Section: Introductionmentioning
confidence: 99%
“…145,156 In order to extend the photoresponse of MO x s to the visible region, many research groups have focused on doping with transition metal ions or non-metal elements, such as V, Co, Ag, Au, Fe, C, N, S, or I. 157À160 Zhang et al successfully doped V ions into TiO 2 NFs by electrospinning together vanadium and TiO 2 precursors and calcining at 500 C. 161 The bers retained their anatase phase aer calcination and XRD results conrmed the successful incorporation of V 4+ or V 5+ ions into the crystal lattice of the anatase TiO 2 NFs and also showed slight variations in crystallite size with an increase in doping ( Fig. 12(a and b)).…”
Section: Photocatalysismentioning
confidence: 99%
“…This can be done very simply by fracturing the silicon substrate and the multilayer film. The face of the fractured multilayer can be investigated using AFM to characterize the interfaces between the individual layers; however, the layers cannot be analyzed by nanoindentation due to the resulting very rough surfaces. A smoother surface of the fractured sample can be prepared by mechanical grinding, polishing, dimpling, and ion milling, as in the investigation of multilayers by high‐resolution transmission electron microscopy (HRTEM) .…”
Section: Mechanical Properties Of Plasma Polymer Filmsmentioning
confidence: 99%