Interrelationship between processing, coatingproperties and functional properties of steered arc physically vapour deposited (Ti,AI)N and (Ti,Nb)N coatings

Roos, Jozef; Célis, Jean-Pierre; Vancoille, E.; Veltrop, H.; Boelens, S.; Jungblut, F.; Ebberink, J.; Homberg, Hellmut

doi:10.1016/s0040-6090(05)80064-1

Cited by 125 publications

(25 citation statements)

References 20 publications

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“…This is consistent with other studies on Ti(Al)N films deposited by PVD and CVD. [43,50,52] The superior oxidation resistance of the Ti(Al)N films, as compared to TiN, which is rather easily oxidized, [57±62] is attributed to a thin aluminum oxide layer that forms on the surface of the Ti(Al)N film when exposed to air. [43,50] The aluminum oxide layer acts as a barrier against oxygen and water diffusion, protecting the underlying nitride layer from further oxidation.…”

Section: Compositionmentioning

confidence: 99%

Trimethylaluminum as a Reducing Agent in the Atomic Layer Deposition of Ti(Al)N Thin Films

Juppo

Alén

Ritala

et al. 2001

Chem. Vap. Deposition

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Ti(Al)N thin films were deposited by atomic layer deposition (ALD) from titanium tetrachloride, ammonia, and trimethylaluminum. The most important role of trimethylaluminum was to act as an extra reducing agent in order to lower the required deposition temperature. The films were deposited using four different schemes, where the pulsing order and pulse time of the reactants, and the deposition temperature, were varied. The film properties were analyzed by energy dispersive X-ray spectroscopy (EDX), time-of-flight elastic recoil detection analysis (TOF-ERDA), X-ray diffraction (XRD), and resistivity measurements. Additionally, the diffusion barrier properties of selected 10 nm thick films were studied. Both carbon and aluminum were incorporated into the Ti(Al)N films. Despite that, at deposition temperatures of 400 C and lower, Ti(Al)N films exhibited better characteristics than TiN films deposited from titanium tetrachloride and ammonia.

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Section: Compositionmentioning

confidence: 99%

Trimethylaluminum as a Reducing Agent in the Atomic Layer Deposition of Ti(Al)N Thin Films

Juppo

Alén

Ritala

et al. 2001

Chem. Vap. Deposition

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“…Even then the researchers were aware that some post indentation corrections were needed [6]. In fact, one of the problems associated with the evaluation of hardness in thin films is the integration of the substrate values in the indentation results.…”

Section: Introductionmentioning

confidence: 99%

Nanoindentation of functionally graded hybrid polymer/metal thin films

Piedade¹

2013

Applied Surface Science

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Hybrid functionally graded coatings (2D-FGC) were deposited by magnetron co-sputtering from poly(tetrafluoroethylene) (PTFE) and AISI 316L stainless steel (316L) targets. The carbon and fluorine content varied from 7.3 to 23.7 at.% and from 0 to 57 at.%, respectively.The surface modification was developed to change the surface of 316L vascular stents in order to improve the biocompatibility of the outmost layer of the metallic biomaterial. Indepth XPS analysis revealed the presence of a graded chemical composition accompanied by the variation of the film structure. These results were complemented by those of transmission electron microscopy (TEM) analysis that highlighted the nanocomposite nature of the coatings.The nanomechanical characterization of 2D-FGC was performed by nanoindentation at several loads on the thin films deposited onto two different steel substrates: 316L and AISI M2. The study allowed establishing 0.7 mN as the load that characterized the coatings without substrate influence. Both hardness and Young modulus decrease with the increase of fluorine content due to the evolution in chemical composition, chemical bonds and structure.

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“…[7] Low-temperature deposition of TiN coatings has been achieved from Ti(NR 2 ) 4 (R = Me, Et) with and without the addition of ammonia. [8] In the temperature range 400±700 C, it has been deposited from the reaction of TiCl 4 and ammonia. [9] At high substrate temperatures, TiN has been deposited from TiCl 4 and a nitrogen/hydrogen mix (1100 C); this has proved particularly effective for coating machine-tool parts.…”

mentioning

confidence: 99%

Atmospheric-Pressure CVD of Vanadium Oxynitride on Glass: Potential Solar Control Coatings

Elwin

Parkin

2000

Chem. Vap. Deposition

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Interrelationship between processing, coatingproperties and functional properties of steered arc physically vapour deposited (Ti,AI)N and (Ti,Nb)N coatings

Cited by 125 publications

References 20 publications

Trimethylaluminum as a Reducing Agent in the Atomic Layer Deposition of Ti(Al)N Thin Films

Trimethylaluminum as a Reducing Agent in the Atomic Layer Deposition of Ti(Al)N Thin Films

Nanoindentation of functionally graded hybrid polymer/metal thin films

Atmospheric-Pressure CVD of Vanadium Oxynitride on Glass: Potential Solar Control Coatings

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