Investigation of Nano Structural Changes by Annealing Temperature and Uniform Oxygen Flow on Ti Layers

Abstract

Problem statement: Ti films of the same thickness, deposition angle (near normal) and deposition rate were deposited on glass substrates at room temperature under UHV conditions. Approach: Different annealing temperatures 423 K, 523 K and 623 K with uniform 7 cm 3 sec −1 , oxygen flow, were used to produce titanium oxide layers. Results: Thin film structures were studied using AFM, XRD and spectrophotometer methods. Roughness of the films changed due to annealing process. Conclusion/Recommendations: The getting property of Ti and annealing temperature can play an important role on the structure of the films.