“…More importantly, if the Cu/Cu interface is defective, e.g., pre-existing interfacial voids or nanoscale roughness due to weak sample preparation and annealing process, damage mechanisms, such as void growth, void coalescence, and mechanical failure, might occur. 26,29,30 This would deteriorate the mechanical integrity and electronic reliability of the components. 31,32 Hence, a deep understanding of the mechanical response of interfacial voids to the annealing-induced tensions is crucial for the successful fabrication of the components.…”