“…[1][2][3][4] Many techniques have been developed to prepare nanostructured materials, such as dealloying, 5 mechanical exfoliation, 6 chemical vapor deposition (CVD) 7 and physical vapor deposition (PVD), 8 sol-gel method, 9,10 electric-arc and arc-discharge methods, [11][12][13] aqueous solution method, 14 selective etching, 15,16 vapor-liquid-solid (VLS) method, 17 nanoimprinting 18,19 and so on. [1][2][3][4] Many techniques have been developed to prepare nanostructured materials, such as dealloying, 5 mechanical exfoliation, 6 chemical vapor deposition (CVD) 7 and physical vapor deposition (PVD), 8 sol-gel method, 9,10 electric-arc and arc-discharge methods, [11][12][13] aqueous solution method, 14 selective etching, 15,16 vapor-liquid-solid (VLS) method, 17 nanoimprinting 18,19 and so on.…”