2020
DOI: 10.3390/s20061603
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Laser-based Thickness Control in a Double-Side Polishing System for Silicon Wafers

Abstract: Thickness control is a critical process of automated polishing of large and thin Si wafers in the semiconductor industry. In this paper, an elaborate double-side polishing (DSP) system is demonstrated, which has a polishing unit with feedback control of wafer thickness based on the scan data of a laser probe. Firstly, the mechanical structure, as well as the signal transmission and control of the DSP system, are discussed, in which the thickness feedback control is emphasized. Then, the precise positioning of … Show more

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(2 citation statements)
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“…For proper performance of the integrated circuits, the silicon wafers are required to have specific thickness. Thus, monitoring of wafer thickness based on the scan data of a laser probe is usually used (Zhu et al 2020).…”
Section: Validation Through An Implementation Showcasementioning
confidence: 99%
“…For proper performance of the integrated circuits, the silicon wafers are required to have specific thickness. Thus, monitoring of wafer thickness based on the scan data of a laser probe is usually used (Zhu et al 2020).…”
Section: Validation Through An Implementation Showcasementioning
confidence: 99%
“…There have been numerous studies aimed at reducing solar energy prices further by various processes, such as research on improving and optimizing the solar cells production technology [3][4][5][6][7][8][9], controlling Si wafer thickness [10], and combining the different renewable energy systems in to a multigeneration system [11,12]. Research and development to obtain and purify Si, used as the raw material for the production of solar cells based on crystalline Si are also needed and therefore conducted in different ways.…”
Section: Introductionmentioning
confidence: 99%