Laser patterning of ITO in flat panel display manufacturing

Venkat, Sri; Dunsky, Corey M.

doi:10.1117/12.653598

Cited by 13 publications

(2 citation statements)

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“…A sample was fabricated by direct laser ablation of indium-tin-oxide (ITO) on glass. The patterning of ITO on glass by UV laser ablation is well established in the flat panel display industry [13]. ITO coated Coring 1737 glass was obtained from Vin Karola Instruments (Norcross, GA, USA).…”

Section: Laser Direct-write Techniquesmentioning

confidence: 99%

Rapid prototyping of frequency selective surfaces by laser direct write

et al. 2007

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In this work we describe the use of laser direct-write for the rapid prototyping of frequency selective surfaces. Frequency selective surfaces are generally described by a periodic array of conducting or dielectric features (i.e. crosses, loops, grids, etc.) that when properly designed can pass or reject specific frequency bands of incoming electromagnetic radiation. While simple frequency selective surfaces are relatively straight forward to design and fabricate, operational demands, particularly military, have motivated the design and fabrication of much more complicated patterns. These new designs combine features of significantly different length scales, randomly dithered patterns and combinations of passive and active elements. We will demonstrate how laser direct-write is an ideal tool for the rapid prototyping of these new more complicated frequency selective surface designs. We will present experimental results for devices fabricated using several different laser direct-write processes.

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Section: Laser Direct-write Techniquesmentioning

confidence: 99%

Rapid prototyping of frequency selective surfaces by laser direct write

et al. 2007

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“…As a result, the target material only remains in the patterned portion [ 8 , 9 ]. Patterning processes with conventional photolithography and lift-off methods are not easy to implement and have the disadvantages of being complicated and having undercut effects, swelling, high process costs, and chemical contamination [ 10 , 11 , 12 ]. Recently, laser-based patterning methods such as laser digital patterning [ 13 , 14 ] and direct laser writing [ 15 , 16 , 17 , 18 ] have been extensively studied.…”

Section: Introductionmentioning

confidence: 99%

Pulsed Laser Ablation Characteristics of Light-Absorbing Mask Layer Based on Coating Thicknesses under Laser Lift-Off Patterning Process

Hyun,

Lee,

Moon

et al. 2024

Micromachines

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Thin transparent oxide layers are typically patterned for use in electronic products including semiconductors, displays, and solar cells for applications such as transparent electrodes, insulating films, and encapsulation films. Conventional patterning methods have traditionally been used in photolithography and lift-off processes. Photolithography employs the wet development process, which has disadvantages such as potential undercut effects, swelling, chemical contamination, and high process costs. On the other hand, laser ablation, which has the advantages of high accuracy, high speed, a noncontact nature, and selective processing, can be used to pattern thin films. However, absorption in transparent oxide films is usually low. In this study, experiments were conducted to determine the ablation characteristics of mask layers. The factors affecting ablation, including beam radii, fluences, overlap ratios, and coating thicknesses, were examined; and the parameters characteristic of residue-free ablation, namely the ablation threshold, minimum fluence, and minimum ablation linewidth, were also examined. The experimental results revealed that the beam radius was an important parameter in determining the resolutions of transparent films and substrates.

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Nanostructuring of ITO thin films through femtosecond laser ablation

Şahin

Kabaçelik

2016

Appl. Phys. A

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Laser patterning of ITO in flat panel display manufacturing

Cited by 13 publications

References 0 publications

Rapid prototyping of frequency selective surfaces by laser direct write

Rapid prototyping of frequency selective surfaces by laser direct write

Pulsed Laser Ablation Characteristics of Light-Absorbing Mask Layer Based on Coating Thicknesses under Laser Lift-Off Patterning Process

Nanostructuring of ITO thin films through femtosecond laser ablation

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