2009
DOI: 10.1063/1.3110104
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Lattice location study of implanted In in Ge

Abstract: We report on emission channeling experiments to determine the lattice location and the thermal stability of implanted 111 In atoms in Ge. The majority of the In atoms was found on the substitutional site, which is a thermally stable site at least up to 500 • C. We also found strong indication that directly after implantation, a fraction of the implanted 111 In atoms occupies the bond-centered site. This fraction disappears after annealing at 300 • C. From comparison with ab initio calculations, electrical stud… Show more

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Cited by 29 publications
(29 citation statements)
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“…Lattice location studies of implanted In in Ge show that the major fraction of In is located on substitutional site and evidence on the formation of InV pairs are found. [35][36][37][38][39][40][41][42] Altogether, as far as atomic diffusion is concerned, the intrinsic and extrinsic diffusion of In in Ge mainly yield information about the charge state of InV and the reduced diffusion coefficient D In ‫ء‬ . Modeling of In diffusion also yields the corresponding profiles of InV pairs and vacancies.…”
Section: B Motivation Of Diffusion Model and Numerical Simulationsmentioning
confidence: 99%
“…Lattice location studies of implanted In in Ge show that the major fraction of In is located on substitutional site and evidence on the formation of InV pairs are found. [35][36][37][38][39][40][41][42] Altogether, as far as atomic diffusion is concerned, the intrinsic and extrinsic diffusion of In in Ge mainly yield information about the charge state of InV and the reduced diffusion coefficient D In ‫ء‬ . Modeling of In diffusion also yields the corresponding profiles of InV pairs and vacancies.…”
Section: B Motivation Of Diffusion Model and Numerical Simulationsmentioning
confidence: 99%
“…The resulting anisotropic electron emission patterns around low-index crystal directions are characteristic for the lattice site occupied by the emitting atom and are measured with a two-dimensional energy-and position-sensitive Si detector of 22ϫ 22 pixels. This technique has been successfully applied previously, determining the lattice location of a range of impurities in several single crystalline matrices, including Ge, [14][15][16][17] reaching an unprecedented accuracy as low as 0.1 Å for very low impurity concentrations ͑Ͻparts per million͒. More details on EC can be found in Ref.…”
mentioning
confidence: 99%
“…During the last five years the EC experiments focused on the lattice location of dopants and impurities in Si [28][29], ZnO [30][31][32][33], GaN [34][35], AlN [36] and, most recently, also in Ge. In Ge, besides the preferred substitutional sites, up to now the following impurities were found to occupy the so-called bond-center (BC) site: Er [37], In [38], the transition metals Fe, Cu and Ag [39], and Sn [40]. By means of investigating the formation energy of defect complexes with the help of density functional theory, the BC location was identified as foreign atoms inside a double vacancy.…”
Section: Emission Channelingmentioning
confidence: 99%