2017
DOI: 10.1016/j.tsf.2016.09.022
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Liquid assisted plasma enhanced chemical vapour deposition with a non-thermal plasma jet at atmospheric pressure

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Cited by 34 publications
(29 citation statements)
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“…The plasma‐based coating process causes this main Si–O–Si peak of the pure precursors to be shifted from 1,050 cm −1 to higher wavenumbers of 1,060–1,085 cm −1 and it was observed that the Si bulk –H x peak between 2,110 and 2,260 cm −1 had completely disappeared. The silica formation process is clearly evident from the spectra leading to the loss of carbon groups and increase in SiO x stoichiometry, [ 30 ] which was also validated by the XPS data (Figure S3).…”
Section: Resultssupporting
confidence: 54%
See 1 more Smart Citation
“…The plasma‐based coating process causes this main Si–O–Si peak of the pure precursors to be shifted from 1,050 cm −1 to higher wavenumbers of 1,060–1,085 cm −1 and it was observed that the Si bulk –H x peak between 2,110 and 2,260 cm −1 had completely disappeared. The silica formation process is clearly evident from the spectra leading to the loss of carbon groups and increase in SiO x stoichiometry, [ 30 ] which was also validated by the XPS data (Figure S3).…”
Section: Resultssupporting
confidence: 54%
“…[ 29 ] Despite these differences, all precursors exhibit a strong and characteristic Si–CH 3 and Si–O–CH 2 – mode, respectively, appearing between 1,250 and 1,260 cm −1 that can be used as a measure for the decomposition and oxidation of the siloxanes. [ 30 ]…”
Section: Resultsmentioning
confidence: 99%
“…As can be clearly seen in Figure a, a dramatic change in the color of the PA12 powder was observed as the pristine PA12 powder is white and becomes light brown after a 1 h exposure, and a darker brown after 2 h. The treated and nontreated powders were also pressed into solid discs with the disc surface displaying a uniform color which reveals that only fewer powder particles were not well‐exposed (see Figure b). Activated atoms and molecules in the electric field during plasma exposure react with the modified surface, creating new oxygenated groups and new chemical functionalities …”
Section: Resultsmentioning
confidence: 99%
“…Plasma‐ a reactive medium containing free electrons, excited and ionized atoms and molecules, radicals, and metastables and VIS‐UV radiation is widely applied also for chemically modification of polymer surfaces, e.g., ultrafine cleaning, functionalization, etching, or thin film deposition . Atmospheric pressure plasma jets are used to improve the wettability and adhesion, as is low pressure plasma .…”
Section: Introductionmentioning
confidence: 99%
“…The application of nt-APPJs for homogeneous surface treatment, such as activation of polymer surfaces, cleaning and thin film deposition [11] is still hampered by the presence of steep local gradients of the plasma parameters due to the chaotic (erratic) nature of the filamented discharge channels (plasma filaments). Their formation in a discharge gap is usually a random function of time and an averaging of spatial filament distribution can be only achieved considering longer time intervals.…”
Section: Introductionmentioning
confidence: 99%