Local Area Deposition of SiOC Films by using a Very-high-frequency Atmospheric Pressure Microplasma Jet from Tetraethoxysilane

Ding, Yi; Kobayashi, Tomohiro; Jia, Haijun; Shirai, Hajime

doi:10.1149/1.3207714

Cited by 2 publications

(3 citation statements)

References 12 publications

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“…In comparison, Si ultrathin films immersed in different dielectric matrices (SiO x , SiN x , and SiC) and their oxide forms (SRO silicon‐rich oxide, SRSO silicon‐rich silicon oxide, SiO x N y , SiO x C y ) have proven to be the best options to obtain Si‐based compound nanomaterials by depositing nonstoichiometric films. [ 36–44 ] It is well known that embedding NPs and QDs in these matrices could substantially change the structure's optical and electrical properties. [ 45 ]…”

Section: Embedding Qds and Nps In Thin‐film Matrices And Their Relati...mentioning

confidence: 99%

“…In comparison, Si ultrathin films immersed in different dielectric matrices (SiO x , SiN x , and SiC) and their oxide forms (SRO silicon-rich oxide, SRSO silicon-rich silicon oxide, SiO x N y , SiO x C y ) have proven to be the best options to obtain Si-based compound nanomaterials by depositing nonstoichiometric films. [36][37][38][39][40][41][42][43][44] It is well known that embedding NPs and QDs in these matrices could substantially change the structure's optical and electrical properties. [45] Regarding the characteristic features of each dielectric matrix and their applications, previous eports describe the increase in the refractive index (RI) by increasing the Si amount in these Si-rich dielectric matrices.…”

Section: Embedding Qds and Nps In Thin-film Matrices And Their Relati...mentioning

confidence: 99%

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Silicon Compound Nanomaterials: Exploring Emission Mechanisms and Photobiological Applications

Dutt,

Salinas,

Martínez-Tolibia

et al. 2023

Advanced Photonics Research

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After the first visible photoluminescence (PL) from porous silicon (pSi), continuous efforts are made to fabricate Si‐based compound nanomaterials embedded in matrices such as oxide, nitride, and carbide to improve optical performance and industrial acceptability. These nanomaterials’ functional and desired properties (nanoparticles and quantum dots embedded in matrices) can vary significantly when embedded in technologically relevant matrices. However, exploring the exact emission mechanisms is one of the remaining challenges from the past few decades. To cover this gap, this review discusses the morphological and optoelectronic properties of Si‐based compound nanomaterials and their correlation with the quantum confinement effect and different surface states to find precise emission mechanisms. One of the biggest challenges of using silicon nanomaterials in the biological sector is the development of sensitive materials of low/acceptable toxicity for identifying target analytes either inside/outside the biological platforms. In this scenario, silicon‐based compound matrices can offer different characteristics and advantages depending on their size configurations and PL emission mechanisms. On the other hand, a proper understanding of these multifaceted silicon nanomaterials’ optical properties (emission mechanisms) can be exploited for pathogen detection and in situ applications in cells and tissues, embarking on a new era of bioimaging technology.

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Section: Embedding Qds and Nps In Thin‐film Matrices And Their Relati...mentioning

confidence: 99%

Section: Embedding Qds and Nps In Thin-film Matrices And Their Relati...mentioning

confidence: 99%

Silicon Compound Nanomaterials: Exploring Emission Mechanisms and Photobiological Applications

Dutt,

Salinas,

Martínez-Tolibia

et al. 2023

Advanced Photonics Research

View full text Add to dashboard Cite

show abstract

“…SiOC films are also fabricated using an atmospheric-pressure microplasma jet from a tetraethoxysilane and argon mixture. The morphology and the fine structure of the coating depend on plasma parameters, which change from particles to a uniform film state with a parabolic- or a dome-shaped profile [62]. Two distinct deposition profiles are observed, i.e.…”

Section: Coating Formation Processesmentioning

confidence: 99%

Polymer derived silicon oxycarbide-based coatings

Erb

2017

International Materials Reviews

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Silicon oxycarbide (SiOC) is a promising protective coating material. However, so far there has not been any comprehensive review to systematically evaluate the characteristics and properties of this material as coatings. In this review, SiOC compositions and fillers are examined based on their fundamental functions in the coating materials. From a processing point of view, different coating formation processes, such as plasma-enhanced chemical vapour deposition, dip coating, and spin coating, are discussed. As an intrinsic requirement and one of the most challenging aspects for SiOC to be used as coating materials, the stability of SiOC in air conditions is analysed and the degradation mechanisms of SiOC are discussed. Lastly, for different application needs, the physical and mechanical behaviours, electrical conductivity, and optical property of the coatings are presented. This first-ever systematic review on the SiOC system as coating materials is intended to provide guidance for future SiOC coating development.

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Local Area Deposition of SiOC Films by using a Very-high-frequency Atmospheric Pressure Microplasma Jet from Tetraethoxysilane

Cited by 2 publications

References 12 publications

Silicon Compound Nanomaterials: Exploring Emission Mechanisms and Photobiological Applications

Silicon Compound Nanomaterials: Exploring Emission Mechanisms and Photobiological Applications

Polymer derived silicon oxycarbide-based coatings

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