Handbook of Magnetism and Advanced Magnetic Materials 2007
DOI: 10.1002/9780470022184.hmm305
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Lorentz Microscopy of Thin‐film Systems

Abstract: As there is growing interest in laterally confined, small magnetic particles in the sub‐µm and sub‐100 nm regime, researchers look for techniques which are capable to quantitatively measure magnetic properties in this range. Electron microscopy offers a technique which combines very high lateral resolution down to presently 5 nm and at the same time high sensitivity to the specimen's magnetic induction. However, to understand fully the present and future possibilities of ‘Lorentz’ electron microscopy, a brief … Show more

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Cited by 5 publications
(5 citation statements)
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“…Besides these techniques, an array of other techniques have been employed in the study of thin magnetic films, in particular, magnetic and surface imaging techniques [352][353][354], including atomic force microscopy (AFM) [355][356][357], magnetic force microscopy (MFM) [358][359][360], scanning tunnelling microscopy (STM) [361][362][363][364][365][366], spinpolarized STM [366][367][368][369][370][371], scanning Kerr microscopy [372], scanning electron microscopy with polarization analysis (SEMPA) [373][374][375][376], photoemission electron microscopy (PEEM) [123,[377][378][379][380][381][382][383], Lorentz microscopy [384][385][386], electron holography [387,388], scanning Hall probe microscopy [389][390][391][392]. The imaging of the surface structure has contributed enormously to our understanding of the correlation between surface morphology and magnetism, in particular for mono...…”
Section: Magnetic Measurement Techniquesmentioning
confidence: 99%
“…Besides these techniques, an array of other techniques have been employed in the study of thin magnetic films, in particular, magnetic and surface imaging techniques [352][353][354], including atomic force microscopy (AFM) [355][356][357], magnetic force microscopy (MFM) [358][359][360], scanning tunnelling microscopy (STM) [361][362][363][364][365][366], spinpolarized STM [366][367][368][369][370][371], scanning Kerr microscopy [372], scanning electron microscopy with polarization analysis (SEMPA) [373][374][375][376], photoemission electron microscopy (PEEM) [123,[377][378][379][380][381][382][383], Lorentz microscopy [384][385][386], electron holography [387,388], scanning Hall probe microscopy [389][390][391][392]. The imaging of the surface structure has contributed enormously to our understanding of the correlation between surface morphology and magnetism, in particular for mono...…”
Section: Magnetic Measurement Techniquesmentioning
confidence: 99%
“…The exploration of the remanent magnetic configurations of the antidot arrays was carried out by LM in Fresnel mode. This allows the direct visualization of magnetic structures by the observation of DWs when they are imaged out of focus [33][34][35][36]. Detailed information about the image formation process in Fresnel mode is presented in the supplementary information (SI, available at stacks.iop.org/NANO/25/385703/ mmedia).…”
Section: Magnetic Imaging By Lorentz Microscopy and Electron Holographymentioning
confidence: 99%
“…An ideal phase plate would consist of a ring that has no appreciable interception of scattered electrons, that does not require any supporting structure yet does not charge up in use, and that can be heated for cleaning if required. For the initial tests reported here, a simple structure was fabricated using the standard techniques of e-beam lithography and lift-off [26]. Resist was spun onto 50 nm low-stress silicon nitride (SiN) membranes supported on 2.9 mm silicon frames [27] and circular rings with diameters from 1 to 5.5 micrometres and nominal widths from 50 to 275 nanometres were written by e-beam lithography within the square window of 0.25 mm side.…”
Section: Fabricationmentioning
confidence: 99%
“…For the initial tests reported here, a simple structure was fabricated using the standard techniques of e-beam lithography and lift-off [26]. Resist was spun onto 50 nm low-stress silicon nitride (SiN) membranes supported on 2.9 mm silicon frames [27] and circular rings with diameters from 1 to 5.5 micrometres and nominal widths from 50 to 275 nanometres were written by e-beam lithography within the square window of 0.25 mm side.…”
Section: Fabricationmentioning
confidence: 99%