Low energy ion beam deposition with positive and negative ions – experiments to and modeling of subsurface growth

Enders, B.; Heck, Claire; Tsubouchi, Nobuteru; Chayahara, Akiyoshi; Kinomura, A.; Horino, Y.; Fujii, Kimio

doi:10.1016/s0168-583x(98)00868-4

Nuclear Instruments and Methods in Physics Research Section B:

1999

DOI: 10.1016/s0168-583x(98)00868-4

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Low energy ion beam deposition with positive and negative ions – experiments to and modeling of subsurface growth

B. Enders

Claire Heck

Nobuteru Tsubouchi

et al.

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2002

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Energetic deposition using filtered cathodic arc plasmas

Anders

2002

Vacuum

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Energetic deposition can be defined as a film deposition process in which a significant fraction of particles arrives at the substrate surface with a kinetic energy greater than the bulk displacement energy of the substrate. Examples of energetic deposition processes are ion beam assisted deposition (IBAD), plasma immersion ion deposition, pulsed laser deposition, and cathodic arc deposition. This work focuses on the production, properties, and use of filtered cathodic arc plasmas. Even without bias, dense metal and metal compound films can be obtained. Biasing the substrate, e.g. using the pulsed biasing technique of plasma immersion ion deposition, extents the possibilities of tuning film properties such as adhesion, stress, surface roughness, elastic modulus, hardness, and density. The formation of ultrathin ta-C (diamondlike carbon) films and metal films will be discussed.

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Energetic deposition using filtered cathodic arc plasmas

Anders

2002

Vacuum

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Low energy ion beam deposition with positive and negative ions – experiments to and modeling of subsurface growth

Cited by 1 publication

References 8 publications

Energetic deposition using filtered cathodic arc plasmas

Energetic deposition using filtered cathodic arc plasmas

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