Low loss, long time stable sol–gel derived silica–titania waveguide films

Karasiński, Paweł; Tyszkiewicz, Cuma; Domanowska, A.; Michalewicz, A.; Mazur, J.

doi:10.1016/j.matlet.2014.12.048

Cited by 38 publications

(25 citation statements)

References 15 publications

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“…The SiO 2 :TiO 2 layers were air dried and subsequently annealed at a temperature of 500 °C for 60 min. Further details concerning this process can be found elsewhere [ 9 , 14 ]. As a result, visually clear, crack-free, and mechanically stable optical layers were obtained.…”

Section: Methodsmentioning

confidence: 99%

“…SiO 2 :TiO 2 waveguide films (alternatively referred to as silica-titania) that were developed at the Silesian University of Technology and that fulfil the requirements listed above are the subject of this paper. Moreover, these films have extremely low optical losses and show stability of parameters over long time periods [ 9 ]. Their usefulness was proved by showing that the manufacturing of grating couplers, rib waveguides, and directional couplers is possible by using them [ 7 , 10 ].…”

Section: Introductionmentioning

confidence: 99%

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Changes in Optical Parameters of SiO2:TiO2 Films Obtained by Sol-Gel Method Observed as a Result of Thermal Treatment

2021

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The research focused on materials having potential applications in technology of planar evanescent wave sensors. Four samples of binary SiO2:TiO2 thin films having different titania content were manufactured through the sol-gel method and dip-coating technique on polished silicon substrates. The samples were subjected to repeated heating/cooling protocols. Simultaneously, their optical parameters were monitored by spectroscopic ellipsometry as they evolved under varying temperature. Subsequent analysis confirmed linear dependence of refractive index on titania content, at least in vis-NIR wavelengths, as well as a low value of the thermal expansion coefficient. It was shown that the thickness of SiO2:TiO2 films decreased as a result of annealing processes, which may be a consequence of reduced porosity.

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Section: Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Changes in Optical Parameters of SiO2:TiO2 Films Obtained by Sol-Gel Method Observed as a Result of Thermal Treatment

2021

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“…Zalety metody zol-żel są bardzo istotne z punktu widzenia możliwości jej zastosowania w technologiach optyki zintegrowanej i struktur fotowoltaicznych. Metoda zol-żel może mieć zastosowania do wytwarzania wysokiej klasy warstw falowodowych [8], warstw sensorowych a w przypadku fotowoltaiki do wytwarzania elektrod transparentnych, warstw akceptorowych, nanocząstek dla fotowoltaiki organicznej [4], zwierciadeł fotonicznych i struktur antyrefleksyjnych [9][10][11]. W tej pracy przedstawiamy zastosowanie metody zol-żel do wytwarzania jedno-i dwuwarstwowych struktur antyrefleksyjnych dla fotoogniw krzemowych.…”

Section: Wprowadzenieunclassified

Jedno- i dwuwarstwowe struktury antyrefleksyjne wytwarzane metodą zol-żel do zastosowań w fotoogniwach krzemowych

Skolik

Karasiński

2017

ELECTROTECHNICAL REVIEW

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Jedno-i dwuwarstwowe struktury antyrefleksyjne wytwarzane metodą zol-żel do zastosowań w fotoogniwach krzemowych Streszczenie. Pomimo pojawienia się wielu nowych rodzajów fotoogniw słonecznych, fotogniwa krzemowe nadal odgrywają istotną rolę. Wysoki współczynnik załamania krzemu sprawia, że ponad 34% fotonów promieniowania słonecznego z zakresu absorpcji krzemu ulega od niego odbiciu i nie generuje w nim ekscytonów. Odbicie światła można istotnie zmniejszyć teksturując powierzchnię krzemu, wytwarzając na niej strukturę antyrefleksyjną albo stosując jednocześnie oba rozwiazania. Praca dotyczy jedno-i dwuwarstwowych struktur antyrefleksyjnych wywtarzanych metodą zol-żel i techniką dip-coating na podłożach krzemowych. Dla struktury jednowarstwowej osiągnięto ważony współczynnik odbicia fotonów R w 9%, natomiast dla struktury dwuwarstwowej osiągnięto R w <4%. W pracy przedstawiano optymalizację teoretyczną struktur antyrefleksyjnych, technologię ich wytwarzania oraz wyniki badań eksperymentalnych. Osiągnięto doskonałą zgodność wyników analizy teoretycznej z wynikami eksperymentalnymi.

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“…The subject of this work involves composite films SiO x :TiO y of high refractive index, fabricated by the sol–gel method and dip-coating technique. Binary composite films SiO x :TiO y with the proportion of components SiO x :TiO y = 1:1 have been investigated by us for many years [ 38 , 39 , 40 , 41 , 42 ]. The films developed by us have high refractive index n ~1.8, low optical losses, they remain stable over many years [ 40 ] and are characterized by high chemical and optical homogeneity [ 41 ].…”

Section: Introductionmentioning

confidence: 99%

High Refractive Index Silica-Titania Films Fabricated via the Sol–Gel Method and Dip-Coating Technique—Physical and Chemical Characterization

et al. 2021

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Crack-free binary SiOx:TiOy composite films with the refractive index of ~1.94 at wavelength 632.8 nm were fabricated on soda-lime glass substrates, using the sol–gel method and dip-coating technique. With the use of transmission spectrophotometry and Tauc method, the energy of the optical band gap of 3.6 eV and 4.0 eV were determined for indirect and direct optical allowed transitions, respectively. Using the reflectance spectrophotometry method, optical homogeneity of SiOx:TiOy composite films was confirmed. The complex refractive index determined by spectroscopic ellipsometry confirmed good transmission properties of the developed SiOx:TiOy films in the Vis-NIR spectral range. The surface morphology of the SiOx:TiOy films by atomic force microscopy (AFM) and scanning electron microscopy (SEM) methods demonstrated their high smoothness, with the root mean square roughness at the level of ~0.15 nm. Fourier-transform infrared (FTIR) spectroscopy and Raman spectroscopy were used to investigate the chemical properties of the SiOx:TiOy material. The developed binary composite films SiOx:TiOy demonstrate good waveguide properties, for which optical losses of 1.1 dB/cm and 2.7 dB/cm were determined, for fundamental TM0 and TE0 modes, respectively.

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Low loss, long time stable sol–gel derived silica–titania waveguide films

Cited by 38 publications

References 15 publications

Changes in Optical Parameters of SiO2:TiO2 Films Obtained by Sol-Gel Method Observed as a Result of Thermal Treatment

Changes in Optical Parameters of SiO2:TiO2 Films Obtained by Sol-Gel Method Observed as a Result of Thermal Treatment

Jedno- i dwuwarstwowe struktury antyrefleksyjne wytwarzane metodą zol-żel do zastosowań w fotoogniwach krzemowych

High Refractive Index Silica-Titania Films Fabricated via the Sol–Gel Method and Dip-Coating Technique—Physical and Chemical Characterization

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