Abstract:Recent progress of low-loss silicon nitride waveguide in polymer is presented. The fabrication technology requires only low temperature (<200°C) processes and standard photolithography. These waveguides feature a large geometric aspect ratio, resulting in a strong waveguide birefringence. For the TM mode an average propagation loss of about 0.72 dB/cm is measured, while for the TE mode the value is about 0.96 dB/cm. Also demonstrated are uniform Bragg-grating filters and sampled grating filters. Since the wave… Show more
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