2023
DOI: 10.1116/6.0002531
|View full text |Cite
|
Sign up to set email alerts
|

Low temperature (<700 °C) SiO2 and Si-rich SiO2 films: Short review

Abstract: SiO2 layers deposited at temperatures (lower than 700 °C) have attracted a great deal of attention for a large variety of applications, since they can be used for dielectric isolation, a needed approach for multilayer, multifunctional coatings that exhibit two or more properties simultaneously. A similar phenomenon occurred with Si-rich SiO2, a two-phase material in which excess silicon, introduced during the deposition process of the films, forms a Si inclusion phase uniformly embedded in a SiO2 matrix, modif… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Publication Types

Select...

Relationship

0
0

Authors

Journals

citations
Cited by 0 publications
references
References 109 publications
0
0
0
Order By: Relevance

No citations

Set email alert for when this publication receives citations?