“…PbZr x Ti 1−x O 3 thin films of various compositions have been prepared using different deposition techniques, such as metal organic chemical vapor deposition (MOCVD) [6], chemical routes with metal organic precursors (sol-gel processing) [7,8] and physical deposition routes as laser ablation [9][10][11][12] and RF magnetron sputtering [13][14][15]. Rf-sputtering has gathered considerable interest given the high quality of the resulted films, relative low surface roughness, high crystallinity and adjustable stoichiometry governed by the plasma parameters [16][17][18].…”