Low Temperature Curable Negative-tone Photo-sensitive Transparent Materials

Okazawa, Toru; Ono, Kunio; Suwa, Mitsuhito

doi:10.2494/photopolymer.25.349

Cited by 5 publications

(10 citation statements)

References 1 publication

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“…Another benefit that can be gained from an easily coatable SSQ sol is that extra functions can be introduced into the material. One of the most attractive functions is photosensitivity . Photo exposure to a thin film that consists of properly formulated SSQs and photoactive compounds yields silicon‐containing small patterns after development.…”

Section: Introductionmentioning

confidence: 99%

“…Photo exposure to a thin film that consists of properly formulated SSQs and photoactive compounds yields silicon‐containing small patterns after development. Both positive‐ and negative‐tone SSQ photoresists have been studied . Loading of Diazonaphthoquinone (DNQ) derivatives give a positive‐tone photoresist .…”

Section: Introductionmentioning

confidence: 99%

“…Loading of Diazonaphthoquinone (DNQ) derivatives give a positive‐tone photoresist . Negative‐tones can be created by loading SSQs with photo acid generators (PAGs) or photo radical initiators …”

Section: Introductionmentioning

confidence: 99%

“…One of the most attractive functions is photosensitivity. [23][24][25][26][27][28][29][30][31][32] Photo exposure to a thin film that consists of properly formulated SSQs and photoactive compounds yields siliconcontaining small patterns after development. Both positive-and negative-tone SSQ photoresists have been studied.…”

Section: Introductionmentioning

confidence: 99%

“…Both positive-and negative-tone SSQ photoresists have been studied. [27][28][29][30][31] Loading of Diazonaphthoquinone (DNQ) derivatives give a positive-tone photoresist. 26 Negative-tones can be created by loading SSQs with photo acid generators (PAGs) 27 or photo radical initiators.…”

Section: Introductionmentioning

confidence: 99%

See 4 more Smart Citations

Styryl silsesquioxane photoresist

Sugita

Tanaka

Shirato

et al. 2014

J of Applied Polymer Sci

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There is a substantial need for photopattern-able, heat resistant, and transparent materials that are applicable to electronic devices, such as imaging or display elements. Styryl silsesquioxane based photoresist forms thin micro patterns after i-line exposure and alkaline development, and the resulting transparent film shows remarkable heat resistance. Radicals generated from a photoinitiator induce polymerization of styryl functionality in the photoresist film to form the micropatterns.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 3 more Smart Citations

Styryl silsesquioxane photoresist

Sugita

Tanaka

Shirato

et al. 2014

J of Applied Polymer Sci

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Behavior of Si-Si Bond Oxidation by Electron Beam Lithography

Noda

Seshimo

Suzuki

et al. 2018

J. Photopol. Sci. Technol.

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Lithography using siloxane polymers is reasonable for process reduction compared to mask etching process. Generally, crosslinkable groups, such as acrylates and epoxides, and protecting groups are added to siloxane polymers for lithography. We synthesized polydiphenylsilane without those functional groups, and the thermal behavior of that was observed with TG-DSC-MS. The thermal elimination of phenyl group from polydiphenylsilane was observed and the thermal weight loss until 500 °C was under 3%. The polysilane film was directly imaged with EB nano melting apparatus (ENF-3500) and line width of pattern was 12.9 µm. The film thicknesses before and after development were same. The partial heating by EB irradiation caused oxidation of polydiphenylsilane after elimination reaction of phenyl group and cleavage of Si-Si bond by XPS analysis.

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Development of Novel Photo-sensitive Light-shielding Bank with High Reflectivity for Next-generation Display

Iizuka

Kobayashi

Suwa

2019

J. Photopol. Sci. Technol.

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A new display with quantum dot color filter (QD-CF) is attracting attention as a nextgeneration display. The QD-CF display can achieve high brightness, definition and contrast. It is essential for QD-CF structure to form "banks" separating QD materials.In this paper, we introduce the novel photo-sensitive light-shielding banks with high reflectivity, which are suitable for QD-CF display. This bank material contains both TiO 2 pigment and UV transparent black pigment. The material can form gray banks which have a thickness of 10 μm with a good taper angle of 86°. The banks show good light-shielding property (transparency@450 nm<1%), high reflectivity of 50.8% at 550 nm, and high heat resistance (1% weight loss temperature is 353 o C). This developed material is ideal for application of QD-CF display.

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Low Temperature Curable Negative-tone Photo-sensitive Transparent Materials

Cited by 5 publications

References 1 publication

Styryl silsesquioxane photoresist

Styryl silsesquioxane photoresist

Behavior of Si-Si Bond Oxidation by Electron Beam Lithography

Development of Novel Photo-sensitive Light-shielding Bank with High Reflectivity for Next-generation Display

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