2008
DOI: 10.1016/j.apsusc.2007.11.006
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Low temperature ITO thin film deposition on PES substrate using pulse magnetron sputtering

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Cited by 68 publications
(36 citation statements)
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“…As-deposited ITO films exhibited a resistivity of 3.1 Â 10 À3 V cm and 74% average optical transmission. Recently, Lin et al [12] reported that the ITO films deposited using RF magnetron sputtering without substrate heating had a resistivity of 4 Â 10 À3 V cm. Similarly Yang et al [13] reported that ITO film prepared on a PC substrate by RF magnetron sputtering exhibited an optical transmittance of 75%.…”
Section: Resultsmentioning
confidence: 99%
“…As-deposited ITO films exhibited a resistivity of 3.1 Â 10 À3 V cm and 74% average optical transmission. Recently, Lin et al [12] reported that the ITO films deposited using RF magnetron sputtering without substrate heating had a resistivity of 4 Â 10 À3 V cm. Similarly Yang et al [13] reported that ITO film prepared on a PC substrate by RF magnetron sputtering exhibited an optical transmittance of 75%.…”
Section: Resultsmentioning
confidence: 99%
“…For touch screens, TC electrodes of sheet resistance in the range of 400-700 Ω/cm 2 are required [13]. ITO films have been prepared on polymer substrates using various techniques, such as radio frequency magnetron sputtering [8], ion beam assisted deposition [14], direct current (dc) reactive magnetron sputtering [15], pulse dc magnetron sputtering [16], roll-to-roll dc sputtering [13], dc sputter type negative metal ion source [17,18], etc. To the best of our knowledge the study of ITO prepared by electron beam evaporation technique on polymer substrates has not been reported.…”
Section: Introductionmentioning
confidence: 99%
“…Figure 3 shows XRD patterns of the ITO monolayer and hybrid layers deposited at RT; analysis was carried out in the 2θ mode over 24-48°. The ITO film shows a (222) peak near 2θ =30° and a (400) diffraction peak near 2θ =35° [17]. The ITO monolayer (Fig.…”
Section: Resultsmentioning
confidence: 99%