Abstract:Contact hole integrity is an important metric for IC manufacturers, which is reflected in tight ellipticity control as part of the lithography tool qualifications. The current ellipticity measurement methodology is very sensitive to random process variations of the contact hole shape. Determining ellipticity in a systematic manner poses a challenge on qualification productivity, as acquiring more data for statistical validity leads to unacceptably long measurement times. The introduction of the so-called Macro… Show more
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