2010
DOI: 10.1002/polb.22062
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Magnetic particle‐loaded polymer brushes induced by external magnetic field: A Monte Carlo simulation

Abstract: The effects of applied magnetic field on the system composed of polymer brushes and magnetic particles are studied by means of Monte Carlo simulation. The direction of the applied magnetic field is chosen to be perpendicular to the substrate plane. Polymer brushes and magnetic particles are attracted to each other. The average heights of polymer brushes depend not only on the strength of applied magnetic field (H) but also on the brush grafting density (r) and the chain length (N). The applied magnetic field i… Show more

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Cited by 11 publications
(15 citation statements)
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“…Our work introduces a model system to study the effects of the applied magnetic field on the conformational properties of charged PEs polymers. Additionally, our previous works22 has provided some good results consistent with the related experiment 23. Although the logical and meaningful results have been obtained, it would be more reasonable if the long‐range property of electrostatic interaction can be seriously considered.…”
Section: Introductionsupporting
confidence: 75%
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“…Our work introduces a model system to study the effects of the applied magnetic field on the conformational properties of charged PEs polymers. Additionally, our previous works22 has provided some good results consistent with the related experiment 23. Although the logical and meaningful results have been obtained, it would be more reasonable if the long‐range property of electrostatic interaction can be seriously considered.…”
Section: Introductionsupporting
confidence: 75%
“…Meanwhile, the values of E PP , E NN , and E PN remain unchanged, indicating the structures of aggregates are relatively stable. The sum of E PP and E NN can be used to show whether the string‐like structures22 are stable or not in energy. Similarly, the sum of E NN , E PN , E PP , and E D reveals the stability of aggregates to some extent.…”
Section: Resultsmentioning
confidence: 99%
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