Manufacturing multilevel metal CMOS with deuterium anneals for improved hot-carrier reliablility

Kizilyalli, I.C.; Abeln, G. C.; Chen, Zhi; Weber, Gary R.; Register, F.; Harris, Edward B.; Chetlur, S.; Higashi, G. S.; Schofieled, M.; Sen, Sidhartha; Kotzias, B.; Roy, P.K.; Lyding, Joseph W.; Hess, K.

doi:10.1117/12.323960

SPIE Proceedings

1998

DOI: 10.1117/12.323960

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Manufacturing multilevel metal CMOS with deuterium anneals for improved hot-carrier reliablility

I.C. Kizilyalli¹,

G. C. Abeln

Zhi Chen

et al.

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Manufacturing multilevel metal CMOS with deuterium anneals for improved hot-carrier reliablility

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