Material choice for optimum stress memorization in SOI CMOS processes

Gehring, A. U.; Mowry, A.; Wei, A.; Wiatr, Maciej; Baburske, Roman; Javorka, P.; Mulfinger, Bob; Scott, Christopher C.; Lenski, M.; Koerner, G.; Huy, Kien Phan; Otterbach, R.; Klais, J.; Geisler, H.; Mantei, T.; Greenlaw, D.; Horstmann, Μ.

doi:10.1109/isdrs.2007.4422444

2007 International Semiconductor Device Research Symposium 2007

DOI: 10.1109/isdrs.2007.4422444

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Material choice for optimum stress memorization in SOI CMOS processes

A. U. Gehring¹,

A. Mowry²,

A. Wei³

et al.

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Material choice for optimum stress memorization in SOI CMOS processes

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