MCSEM- a modular Monte Carlo simulation program for various applications in SEM metrology and SEM photogrammetry

Gnieser, D.; Frase, C. G.; Bosse, Harald; Tutsch, Rainer

doi:10.1007/978-3-540-85156-1_275

Cited by 11 publications

(8 citation statements)

References 3 publications

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“…Various softwares and code systems were developed to fill this need of a 3D Monte Carlo software (Yan et al , '98; Ding and Li, 2005; Ritchie, 2005; Babin et al , 2006; Salvat et al , 2006; Villarrubia et al , 2007; Gnieser et al , 2008; Kieft and Bosch, 2008; Gauvin and Michaud, 2009; Villarrubia and Ding, 2009; Johnsen et al , 2010). However, either because of their limited availability to the scientific community or because of their restriction to expert users only, we have extended the software CASINO (Drouin et al , 2007) to 3D Monte Carlo simulation.…”

Section: Introductionmentioning

confidence: 99%

Three‐dimensional electron microscopy simulation with the CASINO Monte Carlo software

Demers¹,

Poirier-Demers²,

Couture³

et al. 2011

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Monte Carlo softwares are widely used to understand the capabilities of electron microscopes. To study more realistic applications with complex samples, 3D Monte Carlo softwares are needed. In this paper, the development of the 3D version of CASINO is presented. The software feature a graphical user interface, an efficient (in relation to simulation time and memory use) 3D simulation model, accurate physic models for electron microscopy applications, and it is available freely to the scientific community at this website: www.gel.usherbrooke.ca/casino/index.html. It can be used to model backscattered, secondary, and transmitted electron signals as well as absorbed energy. The software features like scan points and shot noise allow the simulation and study of realistic experimental conditions. This software has an improved energy range for scanning electron microscopy and scanning transmission electron microscopy applications.

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Section: Introductionmentioning

confidence: 99%

Three‐dimensional electron microscopy simulation with the CASINO Monte Carlo software

Demers¹,

Poirier-Demers²,

Couture³

et al. 2011

Scanning

295

186

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“…Other programs can simulate 3D structures using analytic descriptions such as constructive quadric geometry, constructive solid geometry, or similar approaches such as MCSEM by Gnieser et al . (), PENELOPE by Salvat et al . (), the CASINO series (Drouin et al ., ; Demers et al ., ), or similar projects presented in Ritchie (), Yan et al .…”

Section: Introductionmentioning

confidence: 79%

“…methods consider, however, simple geometries such as line structures for linewidth metrology such as MONSEL 1 and MONSEL 2 from NIST (Lowney and Marx, '94;Lowney, 95a,b '96;Karabekov et al, 2003), or other specific applications as in Gauvin et al ('95). Other programs can simulate 3D structures using analytic descriptions such as constructive quadric geometry, constructive solid geometry, or similar approaches such as MCSEM by Gnieser et al (2008), PENELOPE by Salvat et al (2011), the CASINO series (Drouin et al, 2007;Demers et al, 2011), or similar projects presented in Ritchie (2005), Yan et al ('98), Ding and Li (2005), and Kieft and Bosch (2008), with an interesting application in Chee et al (2011).…”

mentioning

confidence: 99%

Simulation of FIB‐SEM Images for Analysis of Porous Microstructures

Prill¹,

Schladitz²

2012

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Focused ion beam nanotomography-scanning electron microscopy tomography yields high-quality three-dimensional images of materials microstructures at the nanometer scale combining serial sectioning using a focused ion beam with SEM. However, FIB-SEM tomography of highly porous media leads to shine-through artifacts preventing automatic segmentation of the solid component. We simulate the SEM process in order to generate synthetic FIB-SEM image data for developing and validating segmentation methods. Monte-Carlo techniques yield accurate results, but are too slow for the simulation of FIB-SEM tomography requiring hundreds of SEM images for one dataset alone. Nevertheless, a quasi-analytic description of the specimen and various acceleration techniques, including a track compression algorithm and an acceleration for the simulation of secondary electrons, cut down the computing time by orders of magnitude, allowing for the first time to simulate FIB-SEM tomography.

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“…MCSEM has been developed at the Physikalisch-Technische Bundesanstalt, Braunschweig, Germany [65]. It is a simulation program for the modelling of image formation in scanning electron microscopy, allowing SE, BSE and TE imaging.…”

Section: General-purpose Monte Carlo Programsmentioning

confidence: 99%

Model-based SEM for dimensional metrology tasks in semiconductor and mask industry

Frase¹,

Gnieser²,

Bosse³

2009

J. Phys. D: Appl. Phys.

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The requirements on the use of scanning electron microscopy (SEM) as a measurement technique for the process control of dimensional parameters are most challenging in the production of masks and wafers in the semiconductor industry. Subtle details of SEM signal variations have to be thoroughly understood to be able to monitor and trace small process variations to changes in dimensional parameters of the features to be controlled. This paper reviews the fundamentals, special performance features and applications of existing SEM image contrast simulation packages based on Monte Carlo methods.

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MCSEM- a modular Monte Carlo simulation program for various applications in SEM metrology and SEM photogrammetry

Cited by 11 publications

References 3 publications

Three‐dimensional electron microscopy simulation with the CASINO Monte Carlo software

Three‐dimensional electron microscopy simulation with the CASINO Monte Carlo software

Simulation of FIB‐SEM Images for Analysis of Porous Microstructures

Model-based SEM for dimensional metrology tasks in semiconductor and mask industry

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