Metrology with Synchrotron Radiation

Richter, M.; Ulm, G.

doi:10.1007/978-3-030-23201-6_63

Cited by 4 publications

(3 citation statements)

References 185 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The EUV scatterometry measurements were conducted in the radiometry laboratory of the PTB at the electron storage ring BESSY II at the PTB's soft X-ray beamline [35]- [37]. The soft X-ray beamline is optimized regarding the EUV radiation with photon energy between 50 eV and 1800 eV.…”

Section: Methodsmentioning

confidence: 99%

Precise optical constants: determination and impact on metrology, simulation, and development of EUV masks

Saadeh

Mesilhy²,

Soltwisch

et al. 2022

Photomask Technology 2022

View full text Add to dashboard Cite

The interaction of matter and light can be described based on optical constants, shortly called δ&β. These constants provide the fundamental basis for the design of any optical system. In the Extreme Ultraviolet (EUV) spectral range, however, the existing data for many materials or compounds is very sparse, non-existent or exhibit considerable discrepancies between different sources. This is further complicated since the scaling effects stipulate the optical response of a thin film to differ from bulk. Oxidation, impurities or interdiffusion significantly affect the optical response of a system to EUV radiation. For this reason, the Physikalisch-Technische Bundesanstalt (PTB) is establishing a new database in cooperation with other European partners. This database, designated as the Optical Constants Database (OCDB) can be accessed online freely (OCDB.ptb.de). This data collection shall support further development of various fields from new metrological techniques, like EUV scatterometry to computational lithography in the EUV. This is demonstrated exemplarily here by the interplay between δ&β and the dimensional parameters with respect to a structured TaTeN EUV photomask. It is equally important either direction, to derive structure parameters from the measured EUV scattering as vice versa to predict the EUV response from the geometrical structure. In addition, the impact of varying δ and β on the expected imaging performance will be investigated by simulating typical lithographic image metrics like Critical Dimension (CD), best focus position, image contrast (NILS) and non-telecentricity for the imaging of through pitch L/S and 16 nm vertical Lines with 32 nm pitch in a NA=0.55 scanner for TaTeN mask absorber as typical representatives of high-k absorber materialsand as an example of the effect on imaging simulation.

show abstract

Section: Methodsmentioning

confidence: 99%

Precise optical constants: determination and impact on metrology, simulation, and development of EUV masks

Saadeh

Mesilhy²,

Soltwisch

et al. 2022

Photomask Technology 2022

View full text Add to dashboard Cite

show abstract

“…EUVR and scatterometry measurements took place in the radiometry laboratory of the PTB at the electron storage ring BESSY II at the PTB's soft X-ray beamline [18][19][20]. This beamline is dedicated for the EUV segment spanning the photon energy range 50 eV to 1800 eV.…”

Section: Experimental Setupsmentioning

confidence: 99%

High-precision optical constant characterization of materials in the EUV spectral range: from large research facilities to laboratory-based instruments

Soltwisch

Glabisch

Andrle³

et al. 2022

37th European Mask and Lithography Conference

View full text Add to dashboard Cite

Any modeling of an interaction between photons and matter is based on the optical parameters. The determination of these parameters, also called optical constants or refractive indices, is an indispensable component for the development of new optical elements such as mirrors, gratings, or lithography photomasks. Especially in the extreme ultraviolet (EUV) spectral region, existing databases for the refractive indices of many materials and compositions are inadequate or are a mixture of experimentally measured and calculated values from atomic scattering factors. Synchrotron radiation is of course ideally suited to verify such material parameters due to the tuneability of photon energy. However, due to the large number of possible compounds and alloys, the development of EUV laboratory reflectometers is essential to keep pace with the development of materials science and allow for inline or on-site quality control. Additionally, optical constants are also essential for EUV metrology techniques that aim to achieve dimensional reconstruction of nanopatterned structures with sub-nm resolution. For this purpose, we studied a TaTeN grating created on an EUV Mo/Si multilayer mirror, to mimic a novel absorber EUV photomask. We present here a first reconstruction comparison of these structures, measured by EUV scatterometry at the electron storage ring BESSYII and with a laboratory setup of a spectrally-resolved EUV reflectometer developed at RWTH Aachen University. Both approaches differ in several aspects reaching from setup size to spectral quality (brilliance, bandwidth and coherence) as well as the measured and simulated data.

show abstract

“…: V,-vol 123 Fig. 1 Beamlines and instrumentation at the metrology light source (MLS) [3] Fig. 2 Reconstruction of a periodic Si 3 N 4 nanostructure using machine learning and grazing incidence X-ray fluorescence spectroscopy [6] in 2019.…”

Section: Present Status and Scientific Highlightsmentioning

confidence: 99%

Metrology with synchrotron radiation at PTB

et al. 2022

View full text Add to dashboard Cite

The Physikalisch-Technische Bundesanstalt (PTB) is the national metrology institute of the Federal Republic of Germany and has been using synchrotron radiation (SR) for more than 40 years. Starting at the former facility BESSY I, the storage ring BESSY II (see corresponding article in this volume) has been used for this purpose since 1998, especially in the X-ray range, as well as PTB's own metrology light source (MLS) for lower photon energies since 2008. Both facilities are located in Berlin-Adlershof and are operated by the Helmholtz-Zentrum Berlin within the framework of contractual agreements with PTB. The basic motivation of the work is radiometry. The two storage rings MLS and BESSY II are used as primary source standards and cryogenic radiometers as primary detector standards. The article gives a brief overview of the present status, scientific highlights, the technological development and upgrade plans for the decade 2023–2033 as well as a perspective of next scientific challenges.

show abstract

Metrology with Synchrotron Radiation

Cited by 4 publications

References 185 publications

Precise optical constants: determination and impact on metrology, simulation, and development of EUV masks

Precise optical constants: determination and impact on metrology, simulation, and development of EUV masks

High-precision optical constant characterization of materials in the EUV spectral range: from large research facilities to laboratory-based instruments

Metrology with synchrotron radiation at PTB

Contact Info

Product

Resources

About