MgH 2 thin films deposited by one-step reactive plasma sputtering

Influences and mechanisms of graphene-doping on dehydrogenation properties of MgH2: Experimental and first-principles studies

“…Among of them, nanostructuring [3,4], chemical alloying [5,6], catalyst doping [7,8], surface modifying [9,10], applying stress/strain [11,12], etc. exhibited pronounced effects in enhancing the dehydrogenation characteristics of MgH 2 .…”

Combined XRD and XPS analysis of ex-situ and in-situ plasma hydrogenated magnetron sputtered Mg films

“…Using RF reactive sputtering, Platzer-Björkman et al [9] produced MgH 2 thin films with content equal to 96 mol.% MgH 2 determined by optical analysis. Recently, Le-Quoc et al [10] operating in pulsed-plasma mode demonstrated the hydrogenation rate of the MgH 2 thin film to top up to 98%, thereby producing a nearly fully hydrogenated film in a single-step process. The aim of our work is to investigate the possibility for obtaining MgH 2 by using plasma based two-step hydrogenation approach [9] when pure Mg thin films are synthesized at first step and then at second step they are immersed into hydrogen plasma consisting of energetic H + ions, neutral H 2 molecules, atoms and other particles.…”

Investigation of Mg 2 (Si,Sn) thin films for integrated thermoelectric devices

“…2. The formation of metastable polymorph is relatively common in thin films deposited by PAPVD [41].…”