Micro-structuring of epoxy resists containing nanoparticles by proton beam writing

Sano, Ryo; Hayakawa, S; Hayashi, Hidetaka; Ishii, Yasuyuki; Nishikawa, Hiroyuki

doi:10.1016/j.nimb.2017.01.068

Cited by 3 publications

(1 citation statement)

References 23 publications

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“…The microbeam can be used to generate microstructures with the ion beam writing process, wherein the ion beam, on radiation-sensitive materials, produces microstructures that have significant optical and electrical properties. [17][18][19] Samples that cannot be placed in a vacuum can also be examined in the air using the external ion beam, which is an extension of the microprobe such that the ion beam is drawn into the atmosphere through the thin window at the end of the microbeam chamber and the external detectors record the produced Xray radiation in the air. 20,21 Ion beam writing and machining is a rising scientific branch due to the application for microand nano-structure synthesis and modification of 2D materials such as polymers and semiconductors.…”

Section: Article Scitationorg/journal/rsimentioning

confidence: 99%

Performance and application of heavy ion nuclear microbeam facility at the Nuclear Physics Institute in Řež, Czech Republic

Romanenko

Havránek

Macková

et al. 2019

Review of Scientific Instruments

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The Tandetron Laboratory of the Nuclear Physics Institute of the Czech Academy of Sciences is equipped with five beam lines associated with a 3 MV tandem electrostatic accelerator model 4130 MC from High Voltage Engineering Europa B.V. This accelerator is coupled with two duoplasmatron sources and a single sputter ion source and provides ions from hydrogen to gold. One of these lines is a nuclear microbeam facility, utilizing ion beams of micro- and sub-micro sizes for materials research by use of particle induced x-ray emission spectroscopy, particle induced gamma emission, Rutherford back-scattering spectroscopy, and scanning transmission ion microscopy methods as well as for ion beam writing. The major advantage of the presented microprobe is a possibility of 3D structure creation not only in polymer materials using light ions but also in other materials such as glass, ceramics, etc. by use of heavy ions. The focusing system allows focusing of charged particles with a maximum rigidity of 11 MeV amu/q2. The usual resolution in high and low current modes is 2 × 3 µm2 for a 100 pA and 0.3 × 0.5 µm2 for the 2000 ions/s of 2 MeV protons, respectively. A detailed facility description is given in the paper. The applications of focused beams of heavy ions as well as examples of light ions utilizing are also presented in the article.

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Section: Article Scitationorg/journal/rsimentioning

confidence: 99%

Performance and application of heavy ion nuclear microbeam facility at the Nuclear Physics Institute in Řež, Czech Republic

Romanenko

Havránek

Macková

et al. 2019

Review of Scientific Instruments

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Preliminary study: Measurement of ion beam energy spreads produced by a Penning ionization gauge-type ion source using electromagnets for a mega-electron volt compact ion microbeam system

Ishii

Ohkubo

Kashiwagi

et al. 2020

Review of Scientific Instruments

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The energy spreads of ion beams generated from a penning ionization gauge-type ion source with electromagnets were measured using a parallel electrostatic analyzer. The ion source was developed to be installed in a mega-electron volt (MeV) compact ion microbeam system. A gaseous ion beam of expectedly high brightness and narrow energy spread was generated from the ion source to form a microbeam. To produce such an ion beam, a high-density plasma with a small volume was generated using a strong magnetic field in the ion source. The beam energy spread width was of particular importance because it forms an ion microbeam by reducing the chromatic aberration at a focusing lens. In this report, the energy spread was investigated by changing the parameters of the ion source, e.g., extraction voltage, excitation current of electromagnets, vacuum, and anode voltage. The investigation showed that spread widths are influenced by the extraction voltage, vacuum, and anode voltage. The minimum width of ∼5.0 ± 0.1 eV was obtained at a beam energy of 200 eV. This value is acceptable for the MeV compact ion microbeam system.

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Evolution in Lithography Techniques: Microlithography to Nanolithography

et al. 2022

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In this era, electronic devices such as mobile phones, computers, laptops, sensors, and many more have become a necessity in healthcare, for a pleasant lifestyle, and for carrying out tasks quickly and easily. Different types of temperature sensors, biosensors, photosensors, etc., have been developed to meet the necessities of people. All these devices have chips inside them fabricated using diodes, transistors, logic gates, and ICs. The patterning of the substrate which is used for the further development of these devices is done with the help of a technique known as lithography. In the present work, we have carried out a review on different types of lithographic techniques such as optical lithography, extreme ultraviolet lithography, electron beam lithography, X-ray lithography, and ion beam lithography. The evolution of these techniques with time and their application in device fabrication are discussed. The different exposure tools developed in the past decade to enhance the resolution of these devices are also discussed. Chemically amplified and non-chemically amplified resists with their bonding and thickness are discussed. Mask and maskless lithography techniques are discussed along with their merits and demerits. Device fabrication at micro and nano scale has been discussed. Advancements that can be made to improve the performance of these techniques are also suggested.

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Micro-structuring of epoxy resists containing nanoparticles by proton beam writing

Cited by 3 publications

References 23 publications

Performance and application of heavy ion nuclear microbeam facility at the Nuclear Physics Institute in Řež, Czech Republic

Performance and application of heavy ion nuclear microbeam facility at the Nuclear Physics Institute in Řež, Czech Republic

Preliminary study: Measurement of ion beam energy spreads produced by a Penning ionization gauge-type ion source using electromagnets for a mega-electron volt compact ion microbeam system

Evolution in Lithography Techniques: Microlithography to Nanolithography

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