2012
DOI: 10.1149/04901.0339ecst
|View full text |Cite
|
Sign up to set email alerts
|

Microlens Array Fabricated by Gray-Scale Lithography Maskless System

Abstract: This work presents the fabrication of a high fill factor Fresnel microlens array (MLA) by employing a low-cost home-built maskless exposure lithographic system. A phase relief structure was generated on a photoresist-coated silicon wafer, replicated in Polydimethylsiloxane (PDMS) and electrostatically bonded to a glass substrate. Optical characterization was based on the evaluation of the maximum intensity of each spot generated at the MLA focal plane as well as its full width at half maximum (FWHM) intensity … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Year Published

2014
2014
2016
2016

Publication Types

Select...
2

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
references
References 22 publications
0
0
0
Order By: Relevance