Proceedings of 1994 IEEE 21st International Conference on Plasma Sciences (ICOPS)
DOI: 10.1109/plasma.1994.588979
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Microwave Plasma Considerations Fur Cvd Of Diamond Films At Low Substrate Temperatures

M. Ulczynski
1
,
D.K. Reinhard2,
M. Prystajko
3
et al.
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