Monitoring of semiconductor manufacturing process on Bayesian AEWMA control chart under paired ranked set sampling schemes

Abstract

Quality control often employs memory-type control charts, including the exponentially weighted moving average (EWMA) and Shewhart control charts, to identify shifts in the location parameter of a process. This article pioneers a new Bayesian Adaptive EWMA (AEWMA) control chart, built on diverse loss functions (LFs) such as the square error loss function (SELF) and the Linex loss function (LLF). The proposed chart aims to enhance the process of identifying small to moderate as well as significant shifts in the mean, signifying a notable advancement in the field of quality control. These are implemented utilizing an informative prior for both posterior and posterior predictive distributions, employing various paired ranked set sampling (PRSS) schemes. The effectiveness of the suggested chart is appraised using average run length (ARL) and the standard deviation of run length (SDRL). Monte Carlo simulations are employed to contrast the recommended approach against other control charts. The outcomes demonstrate the dignitary performance of the recommended chart in identifying out-of-control signals, especially applying PRSS designs, in comparison to simple random sampling (SRS). Finally, a practical application was conducted in the semiconductor manufacturing context to appraise the efficacy of the offered chart using various paired ranked set sampling strategies. The results reveal that the suggested control chart performed well in capturing the out-of-control signals far better than the already in use control charts. Overall, this study interposes a new technique with diverse LFs and PRSS designs, improving the precision and effectiveness in detecting process mean shifts, thereby contributing to advancements in quality control and process monitoring.