Multi- and few-layer graphene on insulating substrate via pulsed laser deposition technique

Progress in pulsed laser deposited two-dimensional layered materials for device applications

“…Therefore, the process for direct growth of graphene film on those substrates possessing practical importance is desirable for integrating graphene into electronic devices. [76][77][78][79][80][81][82] Recently, by using a laser ablation method, graphene was directly grown on a Si substrate by Qian et al, with the help of a flowing argon (Ar) gas as background. 76 As shown in Fig.…”

“…Following on from the previous study, Kumar and Khare have reduced the graphene obtained to five layers by adjusting the growth temperature. 79 The scale and thickness of graphene can be accurately modulated by the laser fluences, substrate temperature and ablation time. [79][80][81][82] As well as fabrication with laser ablation and re-condensation strategy, laser reduction is another method used to produce 2D layers.…”

Reduced Graphene Oxide Thin Films with Very Large Charge Carrier Mobility Using Pulsed Laser Deposition

“…Because of the many advantages, PLD has been extensively used for the growth of High TC oxides, ferroelectrics, ferrites, semiconductors, polymers, metals, alloys, carbon nanotubes, and many others [11][12][13]. However, to our knowledge there is no report available on the growth of highquality graphene and RGO films using PLD [14]. This study attempts to synthesize high-quality large area RGO thin films with tunable electronic and optical properties using PLD.…”

Effect of titanium nitride coating on physical properties of three-dimensional graphene

“…11a), there are two main peaks at 1590 and 2700 cm −1 , assigned to the G and 2D bands of graphene, respectively. The G-peak has higher intensity than the 2D-peak that is representative of multi-layer graphene [35]. There is no Dpeak at about 1350 cm −1 in Fig.…”