2021
DOI: 10.21203/rs.3.rs-738060/v1
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Nanometer-scale photon confinement inside dielectrics

Abstract: Optical nanocavities confine and store light, which is essential to increase the interaction between photons and electrons in semiconductor devices, enabling, e.g., lasers and emerging quantum technologies. While temporal confinement has improved by orders of magnitude over the past decades, spatial confinement inside dielectrics was until recently believed to be bounded at the diffraction limit. The conception of dielectric bowtie cavities (DBCs) shows a path to photon confinement inside semiconductors with m… Show more

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Cited by 7 publications
(8 citation statements)
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“…Therefore, we instead benchmark our VH waveguides against conventional line-defect W1 waveguides fabricated on the same chip such that the structural disorder is approximately statistically identical. We extract a minimum propagation loss of (1 ± 1) dB/cm in the non-dispersive region of the W1-waveguide, which constitutes a record-low value for suspended silicon photonics (see Supplementary Section 5) and shows that our nanofabrication [5] provides an ideal testing ground for measuring VH-waveguides with the lowest level of roughness realized to date.…”
Section: Characterization Of Optical Propagation Lossesmentioning
confidence: 86%
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“…Therefore, we instead benchmark our VH waveguides against conventional line-defect W1 waveguides fabricated on the same chip such that the structural disorder is approximately statistically identical. We extract a minimum propagation loss of (1 ± 1) dB/cm in the non-dispersive region of the W1-waveguide, which constitutes a record-low value for suspended silicon photonics (see Supplementary Section 5) and shows that our nanofabrication [5] provides an ideal testing ground for measuring VH-waveguides with the lowest level of roughness realized to date.…”
Section: Characterization Of Optical Propagation Lossesmentioning
confidence: 86%
“…The fabrication process is detailed in Ref. [5] with some minor modifications. Sample 1 is fabricated using a high-resolution electron beam lithography process, the details of which may be found in Ref.…”
Section: Methodsmentioning
confidence: 99%
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“…Our calculations show that lateral dimensions of the order of 40 nm or smaller are required to see significant antibunching, g (2) (0) < 1/2, at cryogenic temperatures, whereas smaller dimensions of around 10 nm are required at room temperature. Such dimensions are within the limits of contemporary nanofabrication [53] using either plasmonic resonators [54,55] or optical cavities with extreme dielectric confinement of light [56,57].…”
mentioning
confidence: 99%