Nanoplasmonics: An Enabling Platform for Integrated Photonics and Biosensing

Lee, Jihye; Yeo, Jong‐Souk

doi:10.5757/asct.2016.25.1.7

Cited by 3 publications

(1 citation statement)

References 96 publications

(98 reference statements)

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“…This large-area nanopatterning technique on a silicon substrate can not only be applied to imprinting or contact transfer printing by fabricating a nanostructure mold as demonstrated in our experiment but also be used for fabricating subwavelength structures applicable in optoelectronic devices for an IoT system. − …”

Section: Discussionmentioning

confidence: 96%

Large-Area Nanopatterning Based on Field Alignment by the Microscale Metal Mask for the Etching Process

Lee

Yeo

2019

ACS Appl. Mater. Interfaces

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Recently, researchers have dedicated efforts toward producing large-area nanostructures using advanced lithography techniques and state-of-the-art etching methods. However, these processes involve challenges such as the diffraction limit and an unintended etching profile. In this work, we demonstrate large-area nanopatterning on a silicon substrate using the microscale metal mask by meticulous optimization of the etching process. Around the vertex of a microscale metal mask, a locally induced electric field is generated by a bias voltage applied on a silicon mold. We utilize this field to change the trajectory of reactive ions and their effect flux, thus providing a controllable bowing effect. The results are analyzed by both numerical simulations and experiments. Based on the field alignment by the metal mask for the etching (FAME) process, we demonstrate the fabrication of 378 nm-size nanostructure patterns which translate to a size reduction of 63% from 1 μm-size mask patterns on a wafer by optimization of the processes. This is much higher than the undercut (∼37%) usually achieved by a typical non-Bosch process under similar etching conditions. The optimized nanostructure is used as a mold for the transfer printing of nanostructure arrays on a flexible substrate to demonstrate that it enables the functionality of FAME-processed nanostructures.

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Section: Discussionmentioning

confidence: 96%

Large-Area Nanopatterning Based on Field Alignment by the Microscale Metal Mask for the Etching Process

Lee

Yeo

2019

ACS Appl. Mater. Interfaces

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Quantum Plasmonics: Energy Transport Through Plasmonic Gap

2021

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scanning tunneling microscopy (STM), [5,6] atomic force microscopy (AFM), [7] and other techniques allowing resolution to be reduced to the atomic scale can help realize atomic-scale world exploration. This is the starting point of the nanotechnology era; since its inception, this technology has changed the nature of almost every human-made object. Six decades after Richard Feynman's lecture, we find that there is still plenty of room at the bottom, through the incorporation of nanophotonics. [8] To elucidate: quantum plasmonics has emerged as an attractive research field in new nanophotonics; research is underway to reveal and accurately describe the quantum nature of electrons at the bottom of extremely confined nano-or sub-nanometer scale materials, using light. [9,10] By exploring the quantum mechanical interactions of matter with light (in particular, using the coherent interactions between the plasmonic cavity and the material), [11][12][13][14][15][16][17][18] these efforts seek to establish new frontiers in information processing technology and to satisfy the everincreasing requirements for speed and capacity in quantum computing, quantum cryptography, and quantum metrology. They might also suggest research fields beyond this, involving the ultimate miniaturization of photonic components and the extreme limits of the light-matter interaction. These advantages may help solve some fundamental problems of electronics, such as those of bandwidth, frequency, and energy consumption. [19] In this review, we describe recent developments in the research of exotic materials capable of mediating quantum plasmonics and inducing quantum energy transport. We briefly provide classical and quantum descriptions of matter, from the bulk, nano, and cluster scales down to atomic matter, exploring the band structures via their optical responses. By considering a single nanoplasmonic material, we describe the theoretical and experimental findings pertaining to assembled nanoplasmonic structures, in the context of the plasmonic gap distance and the type of advanced functional material. The plasmonic gap herein refers to a nanometer or sub-nanometer gap that transports (couples, tunnels, exchanges, confines) electromagnetic energy between plasmonic resonators. Advanced functional materials within an extremely confined metallic resonator are described; these include air/vacuum, aliphatic and conjugated molecules, 2D materials, organic and inorganic materials with At the interfaces of metal and dielectric materials, strong light-matter interactions excite surface plasmons; this allows electromagnetic field confinement and enhancement on the sub-wavelength scale. Such phenomena have attracted considerable interest in the field of exotic material-based nanophotonic research, with potential applications including nonlinear spectroscopies, information processing, single-molecule sensing, organic-molecule devices, and plasmon chemistry. These innovative plasmonics-based technologies can meet the ever-increasing demands for speed and ca...

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