Nanoscale selective area atomic layer deposition of TiO<sub>2</sub>using e-beam patterned polymers

Haider, Ali; Yılmaz, Mehmet; Deminskyi, Petro; Eren, Hamit; Bıyıklı, Necmi

doi:10.1039/c6ra23923d

Cited by 30 publications

(29 citation statements)

References 68 publications

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“…Figure 4 a,b shows the spectra of the Ti 2p region of PTS and PC 60 TS, respectively, as a function of operation time. Prior to the stability test for PTS, the Ti 2p 3/2 peak (at 459.2 eV) and the 2p 1/2 peak (at 464.9 eV) with a spin–orbital‐coupling‐induced peak separation of 5.7 eV were attributed to the distinct Ti 4+ chemical state in TiO 2 (Figure a, black) . As PEC operation duration increased, the binding energy gradually shifted to a lower level (see the dotted lines), revealing an additional satellite peak at ≈457 eV (see Figure S8a and Table S1, Supporting Information, for detailed fitting curves).…”

Section: Resultsmentioning

confidence: 99%

“…Figure 4a,b shows the spectra of the Ti 2p region of PTS and PC 60 TS, respectively, as a function of operation time. [32,33] As PEC operation duration increased, the binding energy gradually shifted to a lower level (see the dotted lines), revealing an additional satellite peak at ≈457 eV (see Figure S8a and Table S1, Supporting Information, for detailed fitting curves). [32,33] As PEC operation duration increased, the binding energy gradually shifted to a lower level (see the dotted lines), revealing an additional satellite peak at ≈457 eV (see Figure S8a and Table S1, Supporting Information, for detailed fitting curves).…”

Section: Resultsmentioning

confidence: 99%

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Fullerene as a Photoelectron Transfer Promoter Enabling Stable TiO₂‐Protected Sb₂Se₃ Photocathodes for Photo‐Electrochemical Water Splitting

Tan

Yang

et al. 2019

Advanced Energy Materials

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Understanding the degradation mechanisms of photoelectrodes and improving their stability are essential for fully realizing solar‐to‐hydrogen conversion via photo‐electrochemical (PEC) devices. Although amorphous TiO2 layers have been widely employed as a protective layer on top of p‐type semiconductors to implement durable photocathodes, gradual photocurrent degradation is still unavoidable. This study elucidates the photocurrent degradation mechanisms of TiO2‐protected Sb2Se3 photocathodes and proposes a novel interface‐modification methodology in which fullerene (C60) is introduced as a photoelectron transfer promoter for significantly enhancing long‐term stability. It is demonstrated that the accumulation of photogenerated electrons at the surface of the TiO2 layer induces the reductive dissolution of TiO2, accompanied by photocurrent degradation. In addition, the insertion of the C60 photoelectron transfer promoter at the Pt/TiO2 interface facilitates the rapid transfer of photogenerated electrons out of the TiO2 layer, thereby yielding enhanced stability. The Pt/C60/TiO2/Sb2Se3 device exhibits a high photocurrent density of 17 mA cm−2 and outstanding stability over 10 h of operation, representing the best PEC performance and long‐term stability compared with previously reported Sb2Se3‐based photocathodes. This research not only provides in‐depth understanding of the degradation mechanisms of TiO2‐protected photocathodes, but also suggests a new direction to achieve durable photocathodes for photo‐electrochemical water splitting.

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Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Fullerene as a Photoelectron Transfer Promoter Enabling Stable TiO₂‐Protected Sb₂Se₃ Photocathodes for Photo‐Electrochemical Water Splitting

Tan

Yang

et al. 2019

Advanced Energy Materials

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“…Occasionally, polymers act as inhibitors to the nucleation of inorganic materials during the ALD process. Based on this phenomenon, some studies have achieved area-selective ALD (AS-ALD) by patterning polymer resists or self-assembled monolayers (SAMs) [77][78][79][80][81]. In the case of a soft polymer with low crosslinking density, the gaseous precursor can diffuse into the polymer and react with the polymer to form an organic-inorganic hybrid material.…”

Section: Conformal Deposition Of Inorganic Thin Films On 3d Polymer Nmentioning

confidence: 99%

Atomic Layer Deposition of Inorganic Thin Films on 3D Polymer Nanonetworks

Ahn

Jeon

et al. 2019

Applied Sciences

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Atomic layer deposition (ALD) is a unique tool for conformally depositing inorganic thin films with precisely controlled thickness at nanoscale. Recently, ALD has been used in the manufacture of inorganic thin films using a three-dimensional (3D) nanonetwork structure made of polymer as a template, which is pre-formed by advanced 3D nanofabrication techniques such as electrospinning, block-copolymer (BCP) lithography, direct laser writing (DLW), multibeam interference lithography (MBIL), and phase-mask interference lithography (PMIL). The key technical requirement of this polymer template-assisted ALD is to perform the deposition process at a lower temperature, preserving the nanostructure of the polymer template during the deposition process. This review focuses on the successful cases of conformal deposition of inorganic thin films on 3D polymer nanonetworks using thermal ALD or plasma-enhanced ALD at temperatures below 200 °C. Recent applications and prospects of nanostructured polymer–inorganic composites or hollow inorganic materials are also discussed.

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“…In this light, area-selective ALD (AS-ALD) increasingly attracts attention over the past several years. AS-ALD enables nanoscale patterning and further downscaling of device dimensions [5,6].…”

Section: Introductionmentioning

confidence: 99%

Inherently area-selective hot-wire assisted atomic layer deposition of tungsten films

et al. 2018

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This work demonstrates area-selective growth of tungsten (W) films by hot-wire assisted atomic layer deposition (HWALD). With this recently developed technique, lowresistivity alpha-phase W films can be deposited by using sequential pulses of atomic hydrogen (at-H) and WF 6 at a substrate temperature of 275 ºC. As reported in this article, the deposition is highly selective. HWALD tungsten grows with little to no incubation time on W, Co and Si surfaces. On the other hand, no growth is observed on TiN, Al 2 O 3 and SiO 2 surfaces. The interfaces of W and various substrates are examined by transmission electron microscopy. The absence of oxygen in the interfaces indicates that the atomic-hydrogen not only serves as a suitable ALD precursor for W, but is here shown to effectively reduce the native oxides of W and Co at the ALD process conditions, enabling in situ surface preparation before starting the deposition sequence.

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Nanoscale selective area atomic layer deposition of TiO₂using e-beam patterned polymers

Abstract: Self aligned nano patterning of TiO2 using area selective atomic area deposition.

Cited by 30 publications

References 68 publications

Fullerene as a Photoelectron Transfer Promoter Enabling Stable TiO₂‐Protected Sb₂Se₃ Photocathodes for Photo‐Electrochemical Water Splitting

Fullerene as a Photoelectron Transfer Promoter Enabling Stable TiO₂‐Protected Sb₂Se₃ Photocathodes for Photo‐Electrochemical Water Splitting

Atomic Layer Deposition of Inorganic Thin Films on 3D Polymer Nanonetworks

Inherently area-selective hot-wire assisted atomic layer deposition of tungsten films

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Nanoscale selective area atomic layer deposition of TiO2using e-beam patterned polymers

Abstract: Self aligned nano patterning of TiO2 using area selective atomic area deposition.

Cited by 30 publications

References 68 publications

Fullerene as a Photoelectron Transfer Promoter Enabling Stable TiO2‐Protected Sb2Se3 Photocathodes for Photo‐Electrochemical Water Splitting

Fullerene as a Photoelectron Transfer Promoter Enabling Stable TiO2‐Protected Sb2Se3 Photocathodes for Photo‐Electrochemical Water Splitting

Atomic Layer Deposition of Inorganic Thin Films on 3D Polymer Nanonetworks

Inherently area-selective hot-wire assisted atomic layer deposition of tungsten films

Contact Info

Product

Resources

About

Nanoscale selective area atomic layer deposition of TiO₂using e-beam patterned polymers

Fullerene as a Photoelectron Transfer Promoter Enabling Stable TiO₂‐Protected Sb₂Se₃ Photocathodes for Photo‐Electrochemical Water Splitting

Fullerene as a Photoelectron Transfer Promoter Enabling Stable TiO₂‐Protected Sb₂Se₃ Photocathodes for Photo‐Electrochemical Water Splitting