“…Over the years, various preparation approaches have been developed for VO x thin films, such as sol-gel, 12 spray pyrolysis, 13 electrodeposition, 14 evaporation, 15 magnetron sputtering, 16 pulsed laser deposition, 17 chemical vapor deposition, 18 and atomic layer deposition (ALD). 6,8,[19][20][21][22][23][24][25][26][27][28][29][30][31][32] Among these approaches, ALD is of particular interest for preparing thin films. ALD employs alternate saturated self-limiting surface chemistry reactions, and allows one to deposit thin films in a well-controlled layer-by-layer fashion.…”