Fourth International Symposium on Quality Electronic Design, 2003. Proceedings.
DOI: 10.1109/isqed.2003.1194721
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New DFM approach abstracts altPSM lithography requirements for sub-100 nm IC design domains

Pradiptya Ghosh1,
Chung-Shin Kang2,
Michael Sanie3
et al.

Abstract: Since the semiconductor industry hit the 0. 18

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