New Gold Nanoparticles Adhesion Process Opening the Way of Improved and Highly Sensitive Plasmonics Technologies

Chapelle, Marc Lamy de la; Shen, Hong; Guillot, Nicolas; Frémaux, Benoît; Guelorget, Bruno; Toury, Timothée

doi:10.1007/s11468-012-9405-x

Cited by 23 publications

(25 citation statements)

References 18 publications

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“…Au layers thicker than 5 nm showed smooth surface morphology that is continuous. In order to check the adhesion and suitability of the MPTMS for lithography to fabricate nanopatterned samples, the following modified lift-off process was performed [22]. After the deposition of MPTMS on Si substrate, the samples were coated with electron beam resist (Poly (methyl methacrylate) (PMMA)) by spin coating at 2000 rpm.…”

Section: Resultsmentioning

confidence: 99%

“…In addition to improving the adhesion, the SAMs also help in achieving highly smooth gold films [21]. Earlier reports on vapour-and liquid-phase deposition of MPTMS monolayer involved a process time that was a few hours to 1 week long [18][19][20][21][22][23][24][25][26]. For practical applications, one needs to have faster deposition methods that help the adhesion of gold to substrates as well as smooth, uniformly covered few monolayer gold films.…”

Section: Introductionmentioning

confidence: 99%

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MPTMS self-assembled monolayer deposition for ultra-thin gold films for plasmonics

2018

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3-mercaptopropyl) trimethoxysilane (MPTMS) as an adhesive layer helps realize plasmon compatible few monolayer uniform gold films. We present, significantly faster, thermally assisted evaporation and immersion methods for MPTMS monolayer deposition. Presence and properties of MPTMS monolayers are established by fourier transform infrared spectra, ellipsometry and atomic force microscopy. Sub-nanometer rough, 0.7 nm thick MPTMS monolayers are used to fabricate large area gold gratings by electron beam lithography followed by either lift-off or reactive ion etching. In addition to retaining the plasmonic response over broadband, MPTMS layer helps realize 5 nm thin gold films of uniform coverage.

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Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

MPTMS self-assembled monolayer deposition for ultra-thin gold films for plasmonics

2018

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“…In this case, the LSPR damping is decreased that induces an improvement of the SERS signal by a factor 10. 80,81 Thus, by combining these effects, we assume that we can gain several orders of magnitude on the detection limits.…”

Section: ■ Results and Discussionmentioning

confidence: 99%

High Sensitivity, High Selectivity SERS Detection of MnSOD Using Optical Nanoantennas Functionalized with Aptamers

et al. 2015

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In this paper, we present the development of a highly sensitive, specific and reproducible nanobiosensor to detect one specific liver cancer biomarker, the manganese super oxide dismutase (MnSOD). The high sensitivity and reproducibility was reached by using SERS on gold nanostructures (nanocylinders and coupled nanorods) produced by electron-beam lithography (EBL). The specificity of the detection was provided by the use of a specific aptamer with high affinity to the targeted protein as a recognition element. With such a sensor, we have been able to observe the SERS signal of the MnSOD at concentrations down to the nM level and to show with negative control that this detection is specific due to the use of the aptamer. This latter issue has allowed us to detect the MnSOD in different body fluids (serum and saliva) at concentrations in the nM range. We have then demonstrated the effectiveness of our SERS nanobiosensor using aptamer as a bioreceptor for the detection of disease biomarker at low concentration and in complex fluids.

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“…27 The dielectric environment of the noble metal is found almost unaffected by such a monolayer, and thus, the induced plasmon resonance shift and near-field damping are minimal. 9,21 Unfortunately, the utilization of molecular adhesion layers has severe drawbacks as it requires additional fabrication steps either in wet 21 or dry 9 conditions and the layers may not withstand oxygen plasma or ultraviolet ozone (UVO) cleaning steps indispensible for reusable plasmonic sensors. 12 In this work, we systematically investigate the damping effect of adhesion layers on the near field enhancement of Au nanostructures.…”

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Engineering Metal Adhesion Layers That Do Not Deteriorate Plasmon Resonances

et al. 2013

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G reat amounts of numerical and experimental investigations have been devoted to boosting the signal of plasmonic sensors fabricated from noble metal nanoantennas with sharp edges or with gaps separated by a few nanometers. 1À8 The field enhancement depends mainly on the ability to couple incident photons to localized surface plasmon modes. Such resonant modes are prone to damping by scattering and absorption in the metal and its surrounding materials, thus, limiting the achievable enhancement. 9 By interference with subradiant modes, as in Fano resonant systems, radiative losses can be reduced, but not suppressed completely. 10,11 In any case, the field enhancement is often severely reduced by the presence of adhesion layers. These layers are required to pin the noble metals to the substrate, particularly when the fabrication requires lift-off and sonication or when the applications demand high structural robustness. 12 Thanks to their broad availability and process compatibility with the evaporation of the noble metals, Cr and Ti are the most commonly used adhesion materials, with typical thicknesses ranging between 1 and 10 nm. 13À15 Although the existence of the adhesion layer is an important part of the plasmonic structure, its influence on the near and far field of the plasmonic modes is often neglected. 9,16 The perturbation of the plasmon resonance can be derived from the real and imaginary parts of the adhesion materials dielectric function which affects the refractive index locally and introduces absorption. Under such circumstances, surface and localized surface plasmon resonances (SPR and LSPR) are red-shifted and broadened, leading to reduced signal sensitivities, caused by the reduced quality factor Q of the resonant mode. 17À21 As a consequence, processes where high near-field amplitudes are needed, such as surface enhanced Raman scattering (SERS) and fluorescence, 16 ABSTRACT Adhesion layers, required to stabilize metallic nanostructures, dramatically deteriorate the performances of plasmonic sensors, by severely damping the plasmon modes. In this article, we show that these detrimental effects critically depend on the overlap of the electromagnetic near-field of the resonant plasmon mode with the adhesion layer and can be minimized by careful engineering of the latter. We study the dependence of the geometrical parameters such as layer thickness and shape on the near-field of localized plasmon resonances for traditional adhesion layers such as Cr, Ti, and TiO 2 . Our experiments and simulations reveal a strong dependence of the damping on the layer thickness, in agreement with the exponential decay of the plasmon near-field. We developed a method to minimize the damping by selective deposition of thin adhesion layers (<1 nm) in a manner that prevents the layer to overlap with the hotspots of the plasmonic structure. Such a designed structure enables the use of standard Cr and Ti adhesion materials to fabricate robust plasmonic sensors without deteriorating their sensitivity.

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New Gold Nanoparticles Adhesion Process Opening the Way of Improved and Highly Sensitive Plasmonics Technologies

Cited by 23 publications

References 18 publications

MPTMS self-assembled monolayer deposition for ultra-thin gold films for plasmonics

MPTMS self-assembled monolayer deposition for ultra-thin gold films for plasmonics

High Sensitivity, High Selectivity SERS Detection of MnSOD Using Optical Nanoantennas Functionalized with Aptamers

Engineering Metal Adhesion Layers That Do Not Deteriorate Plasmon Resonances

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