Nickel Oxyhydroxide Thin Films Prepared by Reactive Sputtering Using O2+H2O Mixed Gas

Ueta, Hideaki; Abe, Yoshio; Kato, Kiyohiko; Kawamura, Midori; Sasaki, Katsutaka

doi:10.1149/ma2007-02/1/32

Meet. Abstr.

2007

DOI: 10.1149/ma2007-02/1/32

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Nickel Oxyhydroxide Thin Films Prepared by Reactive Sputtering Using O2+H2O Mixed Gas

Hideaki Ueta¹,

Yoshio Abe²,

Kiyohiko Kato³

et al.

Abstract: not Available.

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Nickel Oxyhydroxide Thin Films Prepared by Reactive Sputtering Using O2+H2O Mixed Gas

Abstract: not Available.

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