2005
DOI: 10.1016/j.actamat.2004.11.016
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On the mechanism of heterogeneous reaction and phase formation in Ti/Al multilayer nanofilms

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Cited by 115 publications
(48 citation statements)
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“…Advanced fabrication techniques for such systems include physical vapor deposition whereby the individual layers are sputter deposited on a substrate. [2][3][4][5][6][7][8][9] Typically, individual layers have thicknesses in the order of tens of nanometers.…”
Section: Introductionmentioning
confidence: 99%
“…Advanced fabrication techniques for such systems include physical vapor deposition whereby the individual layers are sputter deposited on a substrate. [2][3][4][5][6][7][8][9] Typically, individual layers have thicknesses in the order of tens of nanometers.…”
Section: Introductionmentioning
confidence: 99%
“…It should be noted that when using a Ti target with Al inserts, the aluminium solubility is extremely extended (up to 50.5 at.%), while the use of two targets is responsible for a biphasic structure consisting of two solid solutions, one Ti-rich, (a-Ti), and the other Al-rich, (Al). In this case, the deposition procedure gives rise to a nanometric multilayer whose single-layer thickness (period) is a function of the time that the substrates are in front of each target during one rotation [21]. For the lowest aluminium content (27 at.%), the Al-rich single layers are extremely thin (<1 nm) and this element could diffuse into the Ti-rich layers during the deposition process.…”
Section: Ti-almentioning
confidence: 99%
“…External heating initiates the reaction locally, releasing heat that promotes diffusion and intermixing in adjacent regions, driving the reaction forward in a self-sustained wave. Ni/Al have been the most investigated Me1/Me2 (Me-metal) reactive multilayers, while particular attention has also been paid to nanoscale multilayers from the Ti-Al and Ni-Ti systems, e.g., [4,8,9].…”
Section: Introductionmentioning
confidence: 99%