Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No 1998
DOI: 10.1109/imnc.1998.729965
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OPC Methodology To Overcome Mask Error Effect On Below 0.25 um Lithography Generation

Keeho Kim
1
,
Sriram Madhavan2,
John A. Lilygren3
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