Optical anisotropy induced by ion bombardment of Ag(001)

Everts, Frank; Wormeester, Herbert; Poelsema, Bene

doi:10.1103/physrevb.78.155419

Cited by 16 publications

(29 citation statements)

References 30 publications

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“…The Cu͑001͒ crystal was cleaned with repeated sputter ͑Ar + , 800 eV͒ anneal cycles. 10 The ion-induced patterns were created by sputtering with argon ions along either the ͓110͔ and ͓100͔ azimuth at a temperature of 200 K. After sputtering, the sample was rapidly cooled to below 130 K to avoid as much as possible postannealing effects. Highresolution electron-diffraction experiments were performed at this low temperature.…”

Section: Methodsmentioning

confidence: 99%

“…4,8,9 However, for temperatures below 400 K, a ripple pattern on both Cu and Ag͑001͒ is only observed for grazing incidence sputtering. [10][11][12] As observed for normal-incidence sputtering, 5 the process leading to the etched structures is dominated by the ES barriers on these inherently isotropic surfaces. In their review, Chan and Chason 13 denoted this situation as the "ES instability" region.…”

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confidence: 92%

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Anomalous anisotropy in athermal Bradley-Harper roughening of Cu(001)

2010

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Ion bombardment induced surface structures on Cu͑001͒ have been studied under conditions obeying the previously "coined athermal Bradley-Harper ͑BH͒ region." Off-normal ion impact along the ͗110͘ and the ͗100͘ azimuth at 200 K gives rise to different high-resolution low-energy electron-diffraction patterns. Unanticipated and marked deviations from the inherent fourfold symmetry are obtained already at a polar angle of incidence as low as 10°. Experiments with 800 eV Ar + ions ͑flux 6 ϫ 10 12 ions cm −2 s −1 and fluence 4.3 ϫ 10 16 ions cm −2 ͒ clearly show BH behavior for bombardment along ͓100͔ in contract to bombardment along ͓110͔. This observation is attributed to the higher probability for surface penetration of ions when incident along ͗100͘. This remarkable finding is further corroborated by measurement at various energies between 0.2 and 2 keV along ͓100͔.

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Section: Methodsmentioning

confidence: 99%

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confidence: 92%

Anomalous anisotropy in athermal Bradley-Harper roughening of Cu(001)

2010

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“…The modification and patterning of solid surfaces induced by ion sputtering has received a considerable interest in recent years [1][2][3][4][5][6][7].…”

Section: Introductionmentioning

confidence: 99%

“…Hence, the control of pattern formation on solid surfaces and interfaces during ion beam sputtering has reached a considerable level of sophistication and the structural modifications of surfaces [1][2][3][4][5][6][7] and films [14] bombarded by ions have been now well characterized.…”

Section: Introductionmentioning

confidence: 99%

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Sputtering-induced modification of the electronic properties of Ag/Cu(1 1 1)

Politano¹,

Chiarello²

2010

J. Phys. D: Appl. Phys.

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High-resolution electron energy loss spectroscopy has been used to study the electronic properties of Ag thin films deposited on Cu(111) and modified by Ar + sputtering. Ion sputtering strongly modifies the loss function in the region of single-particle transition as deduced from the appearance of sputtering-induced spectral features in the valence band. In contrast with unmodified Ag systems, in sputtered films the centroid of the induced charge of the surface plasmon lies in the close nearness of the jellium edge. In these modified Ag films, Landau damping processes are activated beyond a critical energy of 3.83 eV and a threshold wave-vector of 0.2 Å-1. Moreover, we found that plural plasmonic losses arose upon increasing Ar + dose. A comparison with the case of the sputtered Ag(100) surface is presented throughout the paper.

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Optical probe for surface and subsurface defects induced by ion bombardment

Sun

Hohage

Zeppenfeld

2013

Physica Rapid Research Ltrs

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We demonstrate that reflectance difference spectroscopy (RDS) is sensitive to defects induced by ion bombardment, located either in the topmost layer or in the subsurface region. Most importantly, these two kinds of defects can be spectrally discriminated, since the corresponding signatures in the RD spectrum arise from perturbations of different types of electronic states: The defects in the topmost surface layer mainly lead to a quenching of the optical anisotropy related to surface states, whereas the subsurface defects strongly affect the optical anisotropy originating from transitions between surface-modified bulk electronic states. Consequently, RDS can be used to simultaneously monitor the defects in the topmost surface layer and in the subsurface region in-situ during ion bombardment and thermal annealing.Characteristic RD spectra and the corresponding STM images for a Cu(110) substrate before and after healing of the subsurface defects.

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Optical anisotropy induced by ion bombardment of Ag(001)

Cited by 16 publications

References 30 publications

Anomalous anisotropy in athermal Bradley-Harper roughening of Cu(001)

Anomalous anisotropy in athermal Bradley-Harper roughening of Cu(001)

Sputtering-induced modification of the electronic properties of Ag/Cu(1 1 1)

Optical probe for surface and subsurface defects induced by ion bombardment

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