Optical channel waveguides with trapezoidal-shaped cross sections in KTiOPO4 crystal fabricated by ion implantation

Chen, Feng; Tan, Yang; Wang, Lei; Hou, Dongchao; Lu, Qingming

doi:10.1016/j.apsusc.2007.07.160

Cited by 15 publications

(10 citation statements)

References 14 publications

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“…At present, waveguides in KTP have been fabricated by both the light ions such as H [8], He [9][10][11][12][13][14][15][16] and the heavy or medium ions such as Ni [17], P [18], Li [15,19], Si [20], or C [21], etc.…”

Section: Introductionmentioning

confidence: 99%

Annealing Characters of KTP Crystal Formed with He+-Ions at High Dose and Low Energy

Yin

Qin

et al. 2011

2011 Symposium on Photonics and Optoelectronics (SOPO)

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A dose of 8×10 16 ions/cm 2 He + ions has been implanted into a z-cut KTP crystal with energy of 150 KeV at room temperature. The refractive index profile has been measured by the Model 2010 Prism Coupler at room temperature and after annealed at temperature of 200℃, 300℃ and 400℃. The surface effective refractive index also has been obtained. The results show that the surface effective refractive index increases with annealing temperature, indicating a process of lattice structure recovery. After annealing at 400℃ for 3.5 hours, the surface effective refractive index n x , n y is nearly to, while n z is still much less than the refractive index of substrate KTP crystal.

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Section: Introductionmentioning

confidence: 99%

Annealing Characters of KTP Crystal Formed with He+-Ions at High Dose and Low Energy

Yin

Qin

et al. 2011

2011 Symposium on Photonics and Optoelectronics (SOPO)

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“…High-quality commercial lasers in visible spectral regimes have been realized in this material via frequency doubling of infrared lasers (Bierlein & Arweiler, 1986). Fabrication of waveguides on KTP have been reported using proton exchange (Roelofs et al, 1993), pulsed laser deposition (PLD) (Wang et al, 1998), and ion implantation (Bindner et al, 2001;Schrempel et al, 2004;Chen et al, 2008d;Wang et al, 2008;. Ion implantation stands among these techniques because it allows an accurate control of the waveguides refractive index profiles by selecting the species, energies and fluences of the incident ions.…”

Section: Potassium Titanium Oxide Phosphate (Ktiopo 4 or Ktp)mentioning

confidence: 99%

“…Chen et al (Chen et al, 2008d) reported the fabrication of trapezoidal-shaped optical channel waveguides on KTiOPO 4 crystal fabricated by He + -ion implantation using photoresist masks with wedged-shaped cross sections ( Figure 15). First, they formed a photoresist-mask with thickness of 5 m, containing a series of strongly wedged smooth stripes with a period Fig.…”

Section: Potassium Titanium Oxide Phosphate (Ktiopo 4 or Ktp)mentioning

confidence: 99%

“…Ion implantation stands among these techniques because it allows an accurate control of the waveguides refractive index profiles by selecting the species, energies and fluences of the incident ions. Fabrication of waveguides on KTP by ion implantation have been reported using H + , He + (Schrempel et al, 2004;Chen et al, 2008d;Dong et al, 2011b), C 3+ , N + , B + (Wesch et al, 2001) and Li + (Schrempel et al, 2002).…”

Section: Potassium Titanium Oxide Phosphate (Ktiopo 4 or Ktp)mentioning

confidence: 99%

“…PM, photoresist mask; BW, barrier walls; PW, planar waveguide; CW, channel waveguide. The sample crystal axes were marked (Chen et al, 2008d).…”

Section: Potassium Titanium Oxide Phosphate (Ktiopo 4 or Ktp)mentioning

confidence: 99%

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Optical Waveguides Fabricated by Ion Implantation/Irradiation: A Review Optical Waveguides Fabricated by Ion Implantation/Irradiation: A Review

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Optical Waveguides Fabricated via Femtosecond Direct Laser Writing: Processes, Materials, and Devices

Cao

Qiu

et al. 2023

Adv Materials Technologies

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As the most fundamental unit of photonic integration, optical waveguides offer the possibility of developing efficient and practical photonic chips by facilitating the on‐chip integration of devices with different functions. Femtosecond direct laser writing (FsDLW), as a burgeoning 3D microfabrication technology, can realize the rapid formation of arbitrary optical waveguides without any mask inside versatile materials, such as crystalline dielectric crystals, glasses, polymers, and photoresists. This significant material‐independence allows FsDLW to combine different materials and manufacturing processes to implement a cross‐platform solution. This review first describes the different optical loss types and suitable measurement methods for different applicable scenes, then summarizes the two fabrication mechanisms and points out the general direction for adjusting the waveguide properties by fabrication processes. Finally, the application fields and development prospects of different materials are discussed by overviewing the characteristics of different materials and the material selection preferences of different devices. With a panoramic view of the development, it is concluded with insights and perspectives of the future development of optical waveguides and processing technology via FsDLW.

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Optical channel waveguides with trapezoidal-shaped cross sections in KTiOPO4 crystal fabricated by ion implantation

Cited by 15 publications

References 14 publications

Annealing Characters of KTP Crystal Formed with He+-Ions at High Dose and Low Energy

Annealing Characters of KTP Crystal Formed with He+-Ions at High Dose and Low Energy

Optical Waveguides Fabricated by Ion Implantation/Irradiation: A Review Optical Waveguides Fabricated by Ion Implantation/Irradiation: A Review

Optical Waveguides Fabricated via Femtosecond Direct Laser Writing: Processes, Materials, and Devices

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