P‐45: Efficient & Selective Rework of LC Alignment Layer with Photo‐Spacer, Protrusion, and Resin Black Matrix on CF & TFT

Abstract

We have developed the new process about PI Poly Imide: Liquid crystal alignment layer of TFT LCD rework with photo‐spacer and/or protrusion and/or resin black matrix for mass production using new chemical & EPD technology. In case of previous PI rework using O2 / SF6, it is seldom possible to remove selectively PI layer without a little damage to photo‐spacer and/or protrusion and/or resin BM including device characteristics such as I‐V curve of TFT and CIE color coordinates. But the present O2 / N2 chemical let the PI layer rework be embodied with a little damage to the photo‐spacer and/or protrusion and/or resin Black Matrix replaced for previous Cr metal BM. Therefore, it is possible for TFT LCD makers to cut‐down drastically the failure‐cost in case of using photo‐spacer narrow & constant cell gap and/or protrusion Vertical Alignment mode‐multi vertical alignment for wide viewing angle and/or resin BM for the 5th generation mother glass size TFT‐LCD.