P‐6: <i>Student Poster:</i> 2731ppi OLED Display with Low Power Consumption and Wide Viewing Angle Using OS/Si VLSI Process Technology

Kimura, Kiyotaka; Tamatsukuri, Yuki; Shishido, Hideaki; Kobayashi, Hidetomo; Isa, Toshiyuki; Takeuchi, Toshihiko; Kunitake, Hitoshi; Kimura, Haijme; Yamazaki, Shunpei

doi:10.1002/sdtp.15681

Cited by 2 publications

(1 citation statement)

References 14 publications

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“…Furthermore, our technology is also compatible with displays with resolutions of higher than 1000 ppi and larger displays such as TVs, which are difficult to fabricate with a fine metal mask. Utilizing the technology described above, we previously reported the 0.99-inch 2731 ppi OLED display [10] and the 1.5-inch 3207 ppi OLED display [11][12][13][14], each of which uses a silicon substrate and targets applications in VR/AR. The technology can also be employed for a display using a glass substrate.…”

Section: Overview Of MML Technologymentioning

confidence: 99%

17‐3: An 8.3‐inch 1058‐ppi OLED Display with Side‐by‐Side Pixel Structure Fully Fabricated by Photolithography

Eguchi,

Oide,

Kato

et al. 2023

Symp Digest of Tech Papers

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We developed a patterning technology via photolithography that does not use a fine metal mask to achieve high resolution for all RGB pixels. An 8.3‐inch 1058‐ppi organic light‐ emitting diode (OLED) display was prototyped using the technology for an oxide semiconductor backplane over a glass substrate. Having no restriction on alignment accuracy, metal mask washing, running costs, etc. in the manufacturing process of medium‐ or large‐sized OLED displays, this technology holds promise for enabling the mass production.

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Section: Overview Of MML Technologymentioning

confidence: 99%

17‐3: An 8.3‐inch 1058‐ppi OLED Display with Side‐by‐Side Pixel Structure Fully Fabricated by Photolithography

Eguchi,

Oide,

Kato

et al. 2023

Symp Digest of Tech Papers

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An OLED display fabricated through side‐by‐side pixel patterning via photolithography

Eguchi,

Kato,

Oide

et al. 2024

J Soc Info Display

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We developed a patterning technology using photolithography that eliminates the need for a fine metal mask, thereby achieving high resolution across all red‐blue‐green pixels of an organic light‐emitting diode (OLED) display. Traditional methods using fine metal masks typically restrict the resolution and size of a display. However, the proposed technology largely bypasses these constraints. Suitable for OLED applications ranging from microdisplays in augmented reality and virtual reality to large TVs exceeding 80 in., our technology overcomes limitations on alignment accuracy, fine metal mask washing, and running costs and paves the way for mass production in OLED manufacturing.

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P‐6: Student Poster: 2731ppi OLED Display with Low Power Consumption and Wide Viewing Angle Using OS/Si VLSI Process Technology

Abstract: A 2731‐ppi OLED display was fabricated. Its source and scan drivers comprise Si transistors, and its pixel circuit comprises oxide semiconductor field‐effect transistors monolithically formed directly on the Si transistors.

Cited by 2 publications

References 14 publications

17‐3: An 8.3‐inch 1058‐ppi OLED Display with Side‐by‐Side Pixel Structure Fully Fabricated by Photolithography

17‐3: An 8.3‐inch 1058‐ppi OLED Display with Side‐by‐Side Pixel Structure Fully Fabricated by Photolithography

An OLED display fabricated through side‐by‐side pixel patterning via photolithography

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