2012
DOI: 10.1039/c2ce25791b
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p-CdTe nanoribbon/n-silicon nanowires array heterojunctions: photovoltaic devices and zero-power photodetectors

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Cited by 39 publications
(25 citation statements)
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“…Furthermore, Xie et al firstly used a Ag-assisted chemical etching method to obtain patterned SiNWs array at particular area on the silicon substrate (Figure 9a). Then, they used mechanically transferred method to transfer CdTe nanoribbons onto the Si substrate and heterojunctions could be formed at the regions where the bottom surface on the nanoribbons contacts with the tips of n-type SiNWs array [53]. Qin et al fabricated n-CdS X Se 1−X /p + -Si parallel-nanobelt heterojunctions on a silicon-on-insulator (SOI) substrate [54].…”
Section: -D Nanostructure/thin Film or Si Substrate Heterojunctionsmentioning
confidence: 99%
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“…Furthermore, Xie et al firstly used a Ag-assisted chemical etching method to obtain patterned SiNWs array at particular area on the silicon substrate (Figure 9a). Then, they used mechanically transferred method to transfer CdTe nanoribbons onto the Si substrate and heterojunctions could be formed at the regions where the bottom surface on the nanoribbons contacts with the tips of n-type SiNWs array [53]. Qin et al fabricated n-CdS X Se 1−X /p + -Si parallel-nanobelt heterojunctions on a silicon-on-insulator (SOI) substrate [54].…”
Section: -D Nanostructure/thin Film or Si Substrate Heterojunctionsmentioning
confidence: 99%
“…Then, they used mechanically transferred method to transfer CdTe nanoribbons onto the Si substrate and heterojunctions could be formed at the regions where the bottom surface on the nanoribbons contacts with the tips of n-type SiNWs array. [53] Qin et al fabricated n-CdSXSe1−X/p + -Si parallel-nanobelt heterojunctions on a silicon-on-insulator (SOI) substrate [54]. First, the CdSXSe1−X nanoribbon suspension was dropped onto the SOI substrate.…”
Section: -D Nanostructure/thin Film or Si Substrate Heterojunctionsmentioning
confidence: 99%
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