Parametric Characterizations of Sputtered Fe/Al Multilayer Thin Films

Karpuz, Ali; Köçkar, Hakan; Çölmekçi, Salih; Uçkun, Mehmet

doi:10.1007/s10948-019-05207-4

Cited by 7 publications

(4 citation statements)

References 20 publications

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“…To explain in more detail, with the decrease in the Cu layers thickness and thus the atomic Cu ratio, the increase in the number of Co magnetic moments per unit volume caused an increase in the magnetization value at the saturated field. It was stated in the study [19] that the incorporation of non-magnetic components into a magnetic material makes it magnetically harder. Within the scope of magnetic analysis, squareness (M r /M s , M r : remanent magnetization) was also determined.…”

Section: The Effect Of Different Thicknesses Of Cu Layersmentioning

confidence: 99%

Investigation of the effects of Cu layer thickness and annealing temperature under air atmosphere on the properties of Co/Cu multilayer films

Karpuz,

Köçkar,

Kaplan

2023

Phys. Scr.

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Co/Cu films were deposited by the sputtering technique. The effects of different thicknesses of non-magnetic (Cu) layers and annealing temperature on magneto-structural properties were investigated. Different thicknesses of Cu layers were determined as 34 nm, 10 nm, 4 nm. Additionally, two annealed situations were considered to investigate the annealing effect. While the first one is exposing the films to 80 oC and 130 oC for 240 s, second one is annealing the films at 180 oC for different exposure times (50 s and 150 s). All films that have different thicknesses of Cu layers crystallized in (111) plane of the face centered cubic (fcc) structure. The intensity of this peak increased with increasing Cu layers thickness. Variation in the thickness of Cu layers has an important effect on the film surface. Saturation magnetization (Ms), coercivity (Hc) and squareness (Mr/Ms, Mr: remanent magnetization) were considerably affected by variation of the Cu content and film surface caused by the change in the thickness of the Cu layers. The film with 4 nm Cu layer thickness has the highest Ms, lowest Hc values and high Mr/Ms ratio. This indicates magnetically high efficient compared to the other films in the same series. The fcc structure continued to exist for the films annealed at 80 oC and 130 oC for 240 s. It was found that the annealing procedure transfigured the film surface and the differences in Ms and Hc values can be mostly attributed to this transfiguration because of the same film content revealed. An increase in Ms value, and a slight decrease in Hc and Mr/Ms values were detected for the annealed film at 130 oC, compared to the film annealed at 80 oC. It was also seen that the film structure was damaged at 180 oC because of excessive heat transfer.

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Section: The Effect Of Different Thicknesses Of Cu Layersmentioning

confidence: 99%

Investigation of the effects of Cu layer thickness and annealing temperature under air atmosphere on the properties of Co/Cu multilayer films

Karpuz,

Köçkar,

Kaplan

2023

Phys. Scr.

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“…It should be noted that in this study most of the deposition parameters and all values of the levels, as well as the method, are different from those used in our previous work [13]. Therefore, under the study with the Taguchi method, M s of Fe/Al MTFs was referred to, and the response and the deposition factors were analysed to obtain the improved M s value for the films.…”

Section: Introductionmentioning

confidence: 97%

“…There are many studies in which Fe is used together with Al to form different types of structures and in which their various properties are examined [11,12]. Fe/Al multilayers are an important type of these structures [13,14]. In [13], Fe/Al multilayers were produced by changing each parameter and keeping the order of the rest of the parameters constant, i.e., using the "one factor at a time" method.…”

Section: Introductionmentioning

confidence: 99%

“…Fe/Al multilayers are an important type of these structures [13,14]. In [13], Fe/Al multilayers were produced by changing each parameter and keeping the order of the rest of the parameters constant, i.e., using the "one factor at a time" method. These param-eters are Al layer thicknesses (7.5, 35, and 95 nm), Al deposition rates (0.02 and 0.06 nm/s), Fe layer thicknesses (7.5, 12.5, and 27.5 nm), and total film thicknesses (100, 125, and 175 nm).…”

Section: Introductionmentioning

confidence: 99%

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Improvement of Saturation Magnetization of Sputtered Fe/Al Multilayer Thin Films Using Taguchi Method Supported by ANOVA, Response Surface Methodology and Regression Analysis

et al. 2023

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Taguchi method has been conducted to improve the saturation magnetisation, Ms, of Fe/Al multilayer thin films deposited using a dual-target magnetron sputtering. The Ms values were obtained from the magnetic hysteresis loops. To evaluate the influence of deposition factors on Ms by using the Taguchi method, L9 orthogonal array with three deposition factors (A -Fe deposition rate, B -Al deposition rate, and C -Fe layer thickness) was carried out with nine experiments at three levels. For the signalto-noise ratio of the "larger is the better", the improved Ms has been obtained at A3B2C3, where factor A is 0.12 nm/s, factor B is 0.03 nm/s, and factor C is 25 nm. At A3B2C3, a verification experiment was carried out with a 95% confidence level to confirm the prediction of 1597.6 emu/cm 3 , and in the experimental run, Ms, exp was found to be 1649.0 emu/cm 3 , which was an improvement from the highest initial run, i.e., Ms, ini = 1540.2 emu/cm 3 , among prescribed runs. Analysis of variance was imposed to obtain the F-ratio and contribution percentage of each deposition factor. Also, the interactions of the deposition factors were determined with response surface methodology. For the structural properties at the best factor combinations, X-ray diffraction experiments revealed that Fe/Al films at A3B2C3 were crystallised with the mixed phase of face-centred cubic and body-centred cubic structures. According to scanning electron microscope images, the film surface is almost uniformly shaped. Furthermore, the model of Ms has also been developed using regression analysis as a function of the deposition factors A, B, and C. Then, from the regression model, high statistical performance was obtained, with values of R 2 and R 2 (adj) being 100 and 100%, respectively. It is seen that the Taguchi method supported by response surface methodology, analysis of variance, and regression analysis turned out to be very successful in finding the factors with proper levels in order to improve Ms of Fe/Al multilayer thin fims within the prescribed limit. topics: Fe/Al multilayer thin films, Taguchi method, response surface method, regression analysis

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