2014
DOI: 10.1007/s10854-014-2480-3
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Patterning ability of conducting polypyrrole thin films by positive photoresist

Abstract: In this paper, patterning ability of ultra-thin films of conducting polypyrrole deposited on silicon wafer surfaces by in situ chemical polymerization in the presence of different anionic dopants including a-naphthalene sulfonic acid, anthraquinone-2-sulfonic acid sodium salt monohydrate/5-sulfosalicylic acid dehydrate and camphor sulfonic acid has been studied. ''Lift-off process'' combined with photolithography is the used method for largearea and easy fabrication of micro patterns of conducting PPy thin fil… Show more

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