Patterning SiC nanoprecipitate in Si single crystals by simultaneous dual- beam ion implantation

Velişa, Gihan; Trocellier, P.; Thomé, L.; Vaubaillon, S.; Sattonnay, G.; Miro, S.; Serruys, Y.

doi:10.1007/s10853-014-8191-6

Cited by 3 publications

(2 citation statements)

References 16 publications

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“…After exposure to air, the as-deposited Fe films quickly developed a nanometric layer of protective oxide [ 56 ] that can account for part of the surface contamination. Additionally, surface contamination can also occur during ion beam measurements [ 57 ].…”

Section: Resultsmentioning

confidence: 99%

Nanoscale Control of Structure and Composition for Nanocrystalline Fe Thin Films Grown by Oblique Angle RF Sputtering

et al. 2022

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The use of Fe films as multi-element targets in space radiation experiments with high-intensity ultrashort laser pulses requires a surface structure that can enhance the laser energy absorption on target, as well as a low concentration and uniform distribution of light element contaminants within the films. In this paper, (110) preferred orientation nanocrystalline Fe thin films with controlled morphology and composition were grown on (100)-oriented Si substrates by oblique angle RF magnetron sputtering, at room temperature. The evolution of films key-parameters, crucial for space-like radiation experiments with organic material, such as nanostructure, morphology, topography, and elemental composition with varying RF source power, deposition pressure, and target to substrate distance is thoroughly discussed. A selection of complementary techniques was used in order to better understand this interdependence, namely X-ray Diffraction, Atomic Force Microscopy, Scanning and Transmission Electron Microscopy, Energy Dispersive X-ray Spectroscopy and Non-Rutherford Backscattering Spectroscopy. The films featured a nanocrystalline, tilted nanocolumn structure, with crystallite size in the (110)-growth direction in the 15–25 nm range, average island size in the 20–50 nm range, and the degree of polycrystallinity determined mainly by the shortest target-to-substrate distance (10 cm) and highest deposition pressure (10−2 mbar Ar). Oxygen concentration (as impurity) into the bulk of the films as low as 1 at. %, with uniform depth distribution, was achieved for the lowest deposition pressures of (1–3) × 10−3 mbar Ar, combined with highest used values for the RF source power of 125–150 W. The results show that the growth process of the Fe thin film is strongly dependent mainly on the deposition pressure, with the film morphology influenced by nucleation and growth kinetics. Due to better control of film topography and uniform distribution of oxygen, such films can be successfully used as free-standing targets for high repetition rate experiments with high power lasers to produce Fe ion beams with a broad energy spectrum.

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Section: Resultsmentioning

confidence: 99%

Nanoscale Control of Structure and Composition for Nanocrystalline Fe Thin Films Grown by Oblique Angle RF Sputtering

et al. 2022

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“…In the last decade, many materials of interest for the nuclear industry have been investigated at the JANNuS platform. A non-exhaustive list includes: nuclear fuel and surrogates such as uranium dioxide [30][31][32][33]; neutron absorber like B4C [34,35]; structural alloys for present, advanced and future fission and fusion systems as well as model metals such as iron, Fe-Cr alloys and ferritic-martensitic steels [36][37][38][39], ODS steels [40][41][42][43][44][45], austenitic steels [46][47][48][49][50][51], tungsten and copper [52][53][54], aluminum alloys [55], zirconium [56][57][58]; Enhanced Accident Tolerant Fuel [59,60]; advanced structural ceramics for innovative nuclear systems such as carbides and nitrides [61][62][63][64][65]; glasses and oxides for waste management [66][67][68][69]; advanced coatings for Liquid Metal fast Reactors [70]; polymers for cable sheath or glove box components [71]. Selected studies are presented in the following that exemplify the prime role of in s...…”

Section: Examples Of Radiation Damage Investigations In Nuclear Mater...mentioning

confidence: 99%

Investigating radiation damage in nuclear energy materials using JANNuS multiple ion beams

Gentils

Cabet

2019

Nuclear Instruments and Methods in Physics Research Section B:

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Ion accelerators have been used by material scientists for decades to investigate radiation damage formation in nuclear materials and thus to emulate neutron-induced changes. The versatility of conditions in terms of particle energy, dose rate, fluence, etc., is a key asset of ion beams allowing for fully instrumented analytical studies. In addition, very short irradiation times and handling of non-radioactive samples dramatically curtail the global cost and duration as compared to in-reactor testing. Coupling of two or more beams, use of heated/cooled sample holders, and implementation of in situ characterization and microscopy pave the way to real time observation of microstructural and property evolution in various extreme radiation conditions more closely mimicking the nuclear environments. For these reasons, multiple ion beam facilities have been commissioned worldwide. In France, under the auspices of the Université Paris-Saclay, the JANNuS platform for 'Joint Accelerators for Nanosciences and Nuclear Simulation' comprises five ion implanter and electrostatic accelerators with complementary performances. At CSNSM (CNRS & Univ Paris-Sud, Orsay), a 200 kV Transmission Electron Microscope is coupled to an accelerator and an implanter for in situ observation of microstructure modifications induced by ion beams in a material, making important contribution to the understanding of physical phenomena at the nanoscale. At CEA Paris-Saclay, the unique triple beam facility in Europe allows the simultaneous irradiation with heavy ions (like Fe, W) for nuclear recoil damage and implantation of a large array of ions including gasses for well-controlled modelling-oriented experiments. Several classes of materials are of interest for the nuclear industry ranging from metals and alloys, to oxides or glasses and carbides. This paper gives selected examples that illustrate the use of JANNuS ion beams in investigating the radiation resistance of structural materials for today's and tomorrow's nuclear reactors.

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Ion beam synthesis of ZrCxOy nanoparticles in cubic zirconia

Velişa

Mylonas

Trocellier

et al. 2016

Journal of Applied Physics

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{110}-oriented yttria-stabilized zirconia single crystals have been implanted with low-energy C ions in an axial direction, at room temperature and at 550 °C. Room temperature ion implantation generated a damage layer that contains the expected dislocation loop clusters. Strikingly, the high temperature implantation produced zirconium oxycarbide nanoparticles (ZrCxOy) at a shallow depth in the yttria-stabilized cubic zirconia crystal, with a diameter in the range of 4–10 nm. Moreover, in the high concentration region of implanted C ions, between 100 and 150 nm below the surface, a number of large precipitates, up to 20 nm, were observed.

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Patterning SiC nanoprecipitate in Si single crystals by simultaneous dual- beam ion implantation

Cited by 3 publications

References 16 publications

Nanoscale Control of Structure and Composition for Nanocrystalline Fe Thin Films Grown by Oblique Angle RF Sputtering

Nanoscale Control of Structure and Composition for Nanocrystalline Fe Thin Films Grown by Oblique Angle RF Sputtering

Investigating radiation damage in nuclear energy materials using JANNuS multiple ion beams

Ion beam synthesis of ZrCxOy nanoparticles in cubic zirconia

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