2011
DOI: 10.1016/j.jallcom.2011.01.141
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PbO–GeO2 rib waveguides for photonic applications

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Cited by 12 publications
(6 citation statements)
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“…The results showed that lower losses are obtained for propagation at 1050 nm in pedestal optical waveguide with 2 cm length. This can be attributed to the fact that lower wavelengths present higher scattering loss due to the roughness of the pedestal lateral sidewall caused by the plasma etching process used for the definition of the pedestal, such as explained in Section 2.3 [23,25,26]. Other characteristics like thickness uniformity and roughness of waveguide sidewalls can also influence.…”
Section: Resultsmentioning
confidence: 99%
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“…The results showed that lower losses are obtained for propagation at 1050 nm in pedestal optical waveguide with 2 cm length. This can be attributed to the fact that lower wavelengths present higher scattering loss due to the roughness of the pedestal lateral sidewall caused by the plasma etching process used for the definition of the pedestal, such as explained in Section 2.3 [23,25,26]. Other characteristics like thickness uniformity and roughness of waveguide sidewalls can also influence.…”
Section: Resultsmentioning
confidence: 99%
“…The obtained PGO pedestal waveguides were annealed at 400°C for 3 h, in order to enhance the transparency of the thin film [23] and to allow the incorporation of REIs in the trivalent form.…”
Section: Preparation Of the Targets And Film Depositionmentioning
confidence: 99%
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“…The parameters used for fabrication are indicated in Table 1. RIB waveguides were obtained from the thin PGO films using optical lithography followed by the reactive ion etching process [17].…”
Section: Samples Preparationmentioning
confidence: 99%