Pbs-Cds bilayers prepared by the chemical bath deposition technique at different reaction temperatures

CdS thin films from two different chemical baths—structural and optical analysis

“…CdS is naturally an n-type material with an optical band gap of 2.4 eV [23,24] employed for depositing CdS thin films are chemical vapour transport [22], vacuum evaporation [13,15,23,26], spray pyrolysis [25,27], electrodeposition [12,[28][29][30], pulsed laser deposition [30], sputtering [31], and chemical bath deposition (CBD) [2,4,5,7,8,10,[16][17][18][19][20][24][25][26][27][28][29][30][31][32][33][34][35][36][37][38][39][40][41][42][43] technique. Of the various methods, CBD technique has many advantages such as simplicity, no requirement for sophisticated instruments, minimum material wastage, economical way of large area deposition, and no need of handling poisonous gases [44].…”

Impact of Gate Dielectric in Carrier Mobility in Low Temperature Chalcogenide Thin Film Transistors for Flexible Electronics

“…Among those, chemical bath deposition ͑CBD͒ processes are attractive because they are simple and inexpensive techniques that can yield homogeneous, adherent, transparent, and highly stoichiometric CdS thin films. 25,26 Typically, in CBD, the CdS films are deposited from the reaction between a cadmium salt and thiourea in an alkaline solution. [27][28][29] Here we report the properties of CdS synthesized by an ammonia-free CBD process employing sodium citrate as the complexing agent.…”

Detailed Analysis of Five Aspects Addressed to Minimize Costs and Waste in the Chemical Bath Deposition of CdS Films Using the Cd<i>B</i>–<i>A</i>C<sub>6</sub>H<sub>5</sub>O<sub>7</sub>–<i>A</i>OH–(NH<sub>2</sub>)<sub>2</sub>CS System

“…However, several authors have reported explicitly or implicitly that the lower the reaction temperature the lower the thin film growth rate [12,15,20,21,23,28,34,35,54,[77][78][79][80][81]84,87,90,[103][104][105][106][107][108][109][110][111][112][113][114][115][116][117][118][119][120][121]. Thus, without delving into the cases in which homogeneous precipitation is favored, which limits the maximum d-a limit which was directly reported [12,15,21] or simply evident in the results reported [115,118,120] by some authors-the use of low temperatures lengthens the time required to achieve a thin film with determined d compared to the time required at higher temperatures.…”

“…Mainly for the economical reason, from this point on we will refer to it as economical formulation-although this can be further enhanced-whose specifications are depicted in Table 3. These specifications can be changed-usually a variation in the Cd 2+ concentration is done-but it is necessary to take into account that the deposition conditions, like the pH of the On the other hand, although different authors have included in their reports studies in which the reaction temperature is varied [12,15,[20][21][22][23][24]27,28,34,35,54,73,[77][78][79][80][81]84,85,87,89,90,, there is no report about the energy consumption of the equipment that keeps constant the temperature of the water bath at a selected value. For this purpose, we measured the energy consumption during the first minutes when a temperature of 30˚C, 50˚C, and 70˚C is achieved, starting from a water bath at 25˚C.…”

“…This citrate-ammonia-containing formulation [28,[30][31][32][33] was later studied by the group made up by Ramí-rez-Bon, Sotelo-Lerma, and collaborators, who also designed a modification, which was first used in a work of Castillo et al in 1998 [34] and first described by Orozco-Terán et al one year later [35]. This modification consisted, basically, in the establishment of the use of cadmium-chloride (CdCl 2 ) as Cd 2+ ions source, and in the use of potassium-hydroxide (KOH) and pH 10 ammonia buffer-composed of ammonium-chloride (NH 4 Cl) and NH 4 OH-instead of only NH 4 OH.…”